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Chinese Academy of Sciences Institutional Repositories Grid
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CAS IR Grid
机构
长春光学精密机械与物... [1]
武汉植物园 [1]
合肥物质科学研究院 [1]
植物研究所 [1]
兰州化学物理研究所 [1]
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OAI收割 [5]
内容类型
期刊论文 [4]
会议论文 [1]
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2016 [2]
2010 [1]
2007 [1]
2006 [1]
学科主题
Horticultu... [1]
材料科学与物理化学 [1]
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UV-C-Induced alleviation of transcriptional gene silencing through plant-plant communication: Key roles of jasmonic acid and salicylic acid pathways
期刊论文
OAI收割
MUTATION RESEARCH-FUNDAMENTAL AND MOLECULAR MECHANISMS OF MUTAGENESIS, 2016, 卷号: 790, 期号: 无, 页码: 56-67
作者:
Xu, Wei
;
Wang, Ting
;
Xu, Shaoxin
;
Li, Fanghua
;
Deng, Chenguang
  |  
收藏
  |  
浏览/下载:33/0
  |  
提交时间:2017/11/21
Uv-c Irradiation
Interplant Communication
Transcriptional Gene Silencing
Jasmonic Acid
Salicylic Acid
Resveratrol Synthesis under Natural Conditions and after Ultraviolet-C Irradiation in Grape Leaves at Different Leaf Developmental Stages
期刊论文
OAI收割
HORTSCIENCE, 2016, 卷号: 51, 期号: 6, 页码: 727-731
作者:
Wang, Junfang
;
Sun, Yuxia
;
Wang, Hengzhen
;
Guan, Xueqiang
;
Wang, Lijun
  |  
收藏
  |  
浏览/下载:16/0
  |  
提交时间:2022/07/08
UV-C irradiation
grape leaf
development
resveratrol
Effect of grape genotype and tissue type on callus growth and production of resveratrols and their piceids after UV-C irradiation
期刊论文
OAI收割
FOOD CHEMISTRY, 2010, 卷号: 122, 期号: 3, 页码: 475-481
作者:
Liu, Wen
;
Liu, Chunyan
;
Yang, Chunxiang
;
Wang, Lijun
;
Li, Shaohua
  |  
收藏
  |  
浏览/下载:29/0
  |  
提交时间:2017/04/13
Stilbene
Callus
UV-C irradiation
Genotype
Tissue type
Ultraviolet irradiation induced changes in the surface of phenolphthalein poly(ether sulfone) film
期刊论文
OAI收割
Applied Surface Science, 2007, 卷号: 253, 页码: 4550-4553
作者:
Wang QH(王齐华)
收藏
  |  
浏览/下载:26/0
  |  
提交时间:2013/11/01
Phenolphthalein poly(ether sulfone) (PES-C)
Ultraviolet (UV) irradiation
Surface characteristic
Photooxidation
Fabrication of polysilicon thin film on glass with low-temperature UV-assisted crystallization (EI CONFERENCE)
会议论文
OAI收割
ICO20: Display Devices and Systems, August 21, 2005 - August 26, 2005, Changchun, China
Huang J. Y.
;
Ling Z. H.
;
Jing H.
;
Fu G. Z.
;
Zhao Y. H.
收藏
  |  
浏览/下载:32/0
  |  
提交时间:2013/03/25
The amorphous silicon (a-Si) film was crystallized on glass by a simple method employed ultraviolet at temperatures as low as 400C. The employ of ultraviolet enhanced the crystallization of amorphous silicon. This method is able to uniformly crystallized large-area amorphous silicon films. The polysilicon films crystallized by this way are suitable for the fabrication of thin film transistors on ordinary glass. Crystallization process is performed in a furnace. Amorphous silicon sample is placed on a hot plate and irradiated by a bank of ultraviolet lamps through a diffuser plate to improve the uniformity of light that irradiates the sample. Raman microscopy is used for analyzing the qualities of UV-assisted crystallized silicon films. By measuring the Raman spectra the effects of anneal temperature and process time on the crystallizing behavior
crystallinity and grain size of the processed films were obtained. There has a threshold temperature for crystallization of amorphous silicon film in the presence of ultraviolet irradiation with certain intensity
i.e. by ultraviolet irradiation with certain intensity only when the temperature is up to the threshold temperature
the crystallization can be triggered. The threshold temperature is 400C when the intensity of ultraviolet irradiation is 1mW/cm2. Above threshold temperature
the increase of anneal temperature increased the rate of crystallization. Crystallinity and grain size extracted from Raman spectra of samples increase with the extending of process time at certain temperature. Crystallization of amorphous silicon film with thickness of 50nm completed within 6 hours at 400C irradiated by ultraviolet with intensity of 2mW/cm2.