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CAS IR Grid
机构
长春光学精密机械与物... [2]
金属研究所 [1]
苏州纳米技术与纳米仿... [1]
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OAI收割 [4]
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会议论文 [2]
期刊论文 [2]
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2015 [1]
2010 [1]
2007 [1]
2005 [1]
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Micro-electro-mechanical systems capacitive ultrasonic transducer with a higher electromechanical coupling coefficient
期刊论文
OAI收割
Micro & Nano Letters, 2015, 卷号: 10, 期号: 10, 页码: 4
作者:
Miao, J(苗静)
;
Shen, WJ(沈文江)
;
He, CD
;
Xue, CY
;
Xiong, JJ
收藏
  |  
浏览/下载:84/0
  |  
提交时间:2015/12/31
silicon
elemental semiconductors
silicon-on-insulator
wafer bonding
electromechanical effects
ultrasonic transducers
capacitive transducers
micromechanical devices
micromachining
vibrations
membranes
finite element analysis
reliability
capacitance
electromechanical coupling coefficient
capacitive micromachined ultrasonic transducer
impedance matching
propagation medium
microelectromechanical system capacitive ultrasonic transducer
silicon on insulator
wafer bonding
optimum geometric dimensions
membrane mechanical vibration
electrical characteristics
finite-element analysis
operation mode
device safety
device reliability
equivalent stress
operation-collapse voltage
bottom electrodes
glass substrate surface
parallel parasitic capacitance
Si
SiO2
ZnO films growth at different temperature on the substrate of Corning glass by MOCVD (EI CONFERENCE)
会议论文
OAI收割
2009 International Symposium on Liquid Crystal Science and Technology, August 2, 2009 - August 5, 2009, Kunming, China
作者:
Zhao J.
;
Gao X.
;
Wang C.
;
Tang W.
收藏
  |  
浏览/下载:25/0
  |  
提交时间:2013/03/25
We deposited ZnO films on Corning glass substrate by metal-organic chemical vapor deposition (MOCVD). We found the diffraction (002) peak at ~34.46
indicating that the ZnO thin films were C-oriented. ZnO films were highly transparent with a transmission ratio larger than 85% in the visible range. The surface morphology of the films was observed by atomic force microscopy (AFM). (2010) Trans Tech Publications.
Photocatalytic performance of TiO2 thin films deposited on glass and quartz substrates
期刊论文
OAI收割
Chinese Journal of Catalysis, 2007, 卷号: 28, 期号: 3, 页码: 269-273
W. J. Zhang
;
S. L. Zhu
;
Y. Li
;
F. H. Wang
;
H. B. He
收藏
  |  
浏览/下载:27/0
  |  
提交时间:2012/04/13
reactive magnetron sputtering
titania
thin film
glass
quartz
substrate
photocatalysis
methyl orange
degradation
phase
oxidation
catalysts
surface
Application of photoresist melting method to the fabrication of holographic grating (EI CONFERENCE)
会议论文
OAI收割
ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005, Changchun, China
作者:
Li W.
;
Tang Y.
;
Yu H.
;
Gao J.
;
Li W.
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  |  
浏览/下载:61/0
  |  
提交时间:2013/03/25
A new technique of reducing surface roughness of photoresist grating is presented. In this paper
photoresist melting method
which is low-cost
short-period and easy realization
is presented. In addition
the influence of photoresist melting on the groove profile of the photoresist grating is investigated. Experimental results show that the surface roughness reduces due to surface tension
when developed photoresist is heated to be melting state by this method. In experiment
when the melted photoresist grating is etched by ion beam
the surface relief grating possessing preferable groove profile is obtained on K9 glass substrate
then the surface is evaporated by aluminum using vacuum evaporation
holographic grating with preferable groove profile is successively fabricated.