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Micro-electro-mechanical systems capacitive ultrasonic transducer with a higher electromechanical coupling coefficient 期刊论文  OAI收割
Micro & Nano Letters, 2015, 卷号: 10, 期号: 10, 页码: 4
作者:  
Miao, J(苗静);  Shen, WJ(沈文江);  He, CD;  Xue, CY;  Xiong, JJ
收藏  |  浏览/下载:84/0  |  提交时间:2015/12/31
silicon  elemental semiconductors  silicon-on-insulator  wafer bonding  electromechanical effects  ultrasonic transducers  capacitive transducers  micromechanical devices  micromachining  vibrations  membranes  finite element analysis  reliability  capacitance  electromechanical coupling coefficient  capacitive micromachined ultrasonic transducer  impedance matching  propagation medium  microelectromechanical system capacitive ultrasonic transducer  silicon on insulator  wafer bonding  optimum geometric dimensions  membrane mechanical vibration  electrical characteristics  finite-element analysis  operation mode  device safety  device reliability  equivalent stress  operation-collapse voltage  bottom electrodes  glass substrate surface  parallel parasitic capacitance  Si  SiO2  
ZnO films growth at different temperature on the substrate of Corning glass by MOCVD (EI CONFERENCE) 会议论文  OAI收割
2009 International Symposium on Liquid Crystal Science and Technology, August 2, 2009 - August 5, 2009, Kunming, China
作者:  
Zhao J.;  Gao X.;  Wang C.;  Tang W.
收藏  |  浏览/下载:25/0  |  提交时间:2013/03/25
Photocatalytic performance of TiO2 thin films deposited on glass and quartz substrates 期刊论文  OAI收割
Chinese Journal of Catalysis, 2007, 卷号: 28, 期号: 3, 页码: 269-273
W. J. Zhang; S. L. Zhu; Y. Li; F. H. Wang; H. B. He
收藏  |  浏览/下载:27/0  |  提交时间:2012/04/13
Application of photoresist melting method to the fabrication of holographic grating (EI CONFERENCE) 会议论文  OAI收割
ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005, Changchun, China
作者:  
Li W.;  Tang Y.;  Yu H.;  Gao J.;  Li W.
收藏  |  浏览/下载:61/0  |  提交时间:2013/03/25
A new technique of reducing surface roughness of photoresist grating is presented. In this paper  photoresist melting method  which is low-cost  short-period and easy realization  is presented. In addition  the influence of photoresist melting on the groove profile of the photoresist grating is investigated. Experimental results show that the surface roughness reduces due to surface tension  when developed photoresist is heated to be melting state by this method. In experiment  when the melted photoresist grating is etched by ion beam  the surface relief grating possessing preferable groove profile is obtained on K9 glass substrate  then the surface is evaporated by aluminum using vacuum evaporation  holographic grating with preferable groove profile is successively fabricated.