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	The Smallest Resonator Arrays in Atmosphere by Chip-Size-Grown Nanowires with Tunable Q-factor and Frequency for Subnanometer Thickness Detection 期刊论文 OAI收割 NANO LETTERS, 2015, 卷号: 15, 期号: 2, 页码: 1128-1134 作者: Jiang, Chengming; Tang, Chaolong; Song, Jinhui \| 收藏 \| 浏览/下载：26/0 \| 提交时间：2018/03/15 Nanowire resonator nanoresonator arrays NEMS size effect half dimension thickness detection
	Micro-motion exposure method based on PZT piezoelectric ceramics (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging 2009: Material and Device Technology for Sensors, June 17, 2009 - June 19, 2009, Beijing, China 作者: Meng Z.; Meng Z. 收藏 \| 浏览/下载：103/0 \| 提交时间：2013/03/25 There mainly is laser digital photofinishing technique and digital photofinishing technique based on LCD consisting of TFT and LCOS in the digital photofinishing field at the present time. The former have a good many merit such as wide color gamut high processing rate large output size and high brightness but his cost is very high his maintain technique being comparatively complex that result in difficult use for people. The utilization ratio of the latter is low because of lower resolution and lower aperture ratio for LCD but the digital photofinishing based on LCD have lower cost and higher utilization ration being suitable for people's current standard of living. Considering above mentioned problem a micro-motion exposure method based on PZT piezoelectric ceramics used in digital image photofinishing is presented. The two-dimension micro-motion exposure system consisting of PZT piezoelectric ceramics LCD panel polarizing film and spring strip is designed. By means of PZT piezoelectric ceramics the LCD panel is removed about the one half of the pixel size of the LCD panel for four times from the original place at the same time imaging system is exposed four times at the printing paper. The software is used to control the time synchronization the exposure time and motion range of the LCD panel. The system has advantages such as shorter response time than 0.1seconds lesser motion error than 0.01 microns high stability and repeatability. Experimental results show that the proposed micro-motion exposure method improve the picture brightness and enlarge output size at the meantime reducing the cost of the system. 2009 SPIE.
	Contrast research on interpolation and subpixel imaging in CCD geometric superresolution reconstruction (EI CONFERENCE) 会议论文 OAI收割 1st Asia Pacific Conference on Postgraduate Research in Microelectronics and Electronics, PrimeAsia 2009, November 19, 2009 - November 21, 2009, Shanghai, China 作者: Xu Y.-S.; Yang S.-W. 收藏 \| 浏览/下载：24/0 \| 提交时间：2013/03/25 In order to enhance the resolution of Charge Coupled Device (CCD) pixel with the pixel dimension and focal length of optical system unchanged the problem of CCD geometric superresolution is educed. The problem is discussed in terms of software and hardware. In software the bicubic interpolation is introduced while in hardware the subpixel imaging method is utilized. The subpixel imaging method integrates two uniform linear CCDs staggered by half dimension of pixel in one device. In operation the line frequency is doubled. At last the collected data is interweaved to synthesize a high resolution image. The two methods bicubic interpolation and subpixel imaging are simulated with Matlab7.0.1. The qualitative and quantitative analyses are given. The simulated results of lanczos and cubic spline interpolation methods are given simultaneously to show the performance of interpolation. The simulation result shows that the result images quality becomes better in both methods but compared with bicubic interpolation method the synthesized image PSNR gained from sub-pixel imaging is averagely enhanced by 2.1682dB while the elapsed time is reduced to be about one forth. The subpixel imaging method could significantly mitigate the image blur introduced by undersample. 2009 IEEE.
	Investigation of growth mode in ZnO thin films prepared at different temperature by plasma-molecular beam epitaxy (EI CONFERENCE) 会议论文 OAI收割 13th International Conference on Molecular Beam Epitaxy, August 22, 2004 - August 27, 2004, 13th International Conference on Molecular Beam Epitaxy, August 22, 2004 - August 27, 2004 Liang H. W.; Lu Y. M.; Shen D. Z.; Yan J. F.; Li B. H.; Zhang J. Y.; Liu Y. C.; Fan X. W. 收藏 \| 浏览/下载：37/0 \| 提交时间：2013/03/25 High-quality ZnO thin films on c-plane sapphire (Al2O 3) substrates were prepared by plasma-molecular beam epitaxy (P-MBE). The influence of growth temperature on growth mode of ZnO was investigated. Real-time monitored by reflection high-energy electron diffraction (RHEED) images show that below 500 C ZnO thin film was grown by three-dimension (3D) growth mode. While the two-dimension (2D) growth mode was obtained above growth temperature of 650 C. Atomic force microscopy (AFM) images present that the surface morphology of ZnO thin film with 2D growth is improved and X-ray rocking curves (XRC) indicate that the full width at half maximum (FWHM) of the ZnO (0 0 2) peak becomes narrow. From the photoluminescence (PL) spectra ultraviolet (UV) emission peak exhibits obvious blue-shift for the samples grown at lower temperature which is attributed to the effect of the quantum confinement arisen from small crystal grain sizes. The minimum carrier concentration of N=7.661016 cm-3 was obtained in the ZnO thin films with the 2D grown which is closed to that of bulk ZnO. 2005 Elsevier B.V. All rights reserved.