中国科学院机构知识库网格
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Prediction of oxygen distribution in the waste mass from an aeration well in bioreactor landfills 期刊论文  OAI收割
WASTE MANAGEMENT & RESEARCH, 2023
作者:  
Zhu, Lei;  Jin, Jiaxu;  Liu, Lei
  |  收藏  |  浏览/下载:17/0  |  提交时间:2023/08/02
Introducing a special collection of papers in the Journal of High Energy Astrophysics on the Early Results of China's 1st X-ray Astronomy Satellite: Insight-HXMT 期刊论文  OAI收割
Journal of High Energy Astrophysics, 2020, 卷号: 27, 页码: 51-52
作者:  
HXMT
  |  收藏  |  浏览/下载:51/0  |  提交时间:2022/02/08
Astrophysics - High Energy Astrophysical Phenomena  Abstract: Insight-HXMT is the first Chinese X-ray astronomical mission, launched successfully on June 15, 2017, from China's Jiuquan Satellite Launch Center. Insight-HXMT was designed to have a broad energy coverage in X-rays, from 1-250 keV, with excellent timing and adequate energy resolution at soft X-rays, and the largest effective area at hard X-rays. This allows, in particular, to observe bright sources like X-ray binaries (XRBs) in their bright/outburst states with high cadence and high statistics at hard and soft X-rays at once. It was then expected that the Insight-HXMT mission will bring us new insights regarding the characteristics of several source classes. Examples include characterizing High-Mass X-ray Binaries (HMXBs) and the outburst evolution of Low-Mass X-ray Binaries (LMXBs). For instance, in HMXB systems, the region around their Alfven radius that is responsible to determine whether accretion or propeller occurs, or the region around the NS magnetic pole where the intense X-rays are supposed to be produced are specially appealing targets of study. For the LMXBs, the evolution the outburst and the properties of the compact objects themselves are obvious priority targets for Insight-HXMT. Due to the broad coverage in energy, Insight-HXMT is specially well suited to study the influence of thermonuclear (type-I) X-ray bursts upon the surrounding environment.  
Evaluation of dual permeability of gas flow in municipal solid waste: Extraction well operation 期刊论文  OAI收割
ENVIRONMENTAL PROGRESS & SUSTAINABLE ENERGY, 2016, 卷号: 35, 期号: 5, 页码: 1381-1386
作者:  
Liu, Lei;  Ma, Jun;  Xue, Qiang;  Zeng, Gang;  Zhao, Ying
  |  收藏  |  浏览/下载:14/0  |  提交时间:2018/06/05
Automatic spin coater for concave spherical substrate (EI CONFERENCE) 会议论文  OAI收割
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
Fengchao L.; Jingsong G.; Xiaoguo F.; Jingli Z.; Zhijun X.; Jun H.; Fenglin X.; Huiqing W.; Xiaohan L.
收藏  |  浏览/下载:23/0  |  提交时间:2013/03/25
Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer  for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS  an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively  valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed  acceleration and viscosity of the photoresist. After development  the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate  the film thickness error was within 1%  and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater  which contributes to quality improvement of laser direct writing lines on CSS.