中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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Decisions of OFDI Engagement and Location for Heterogeneous Multinational firms: Evidence from Chinese firms 期刊论文  OAI收割
TECHNOLOGICAL FORECASTING AND SOCIAL CHANGE, 2016, 卷号: 112, 页码: 178-187
作者:  
Shao, Yanmin;  Shang, Yan
  |  收藏  |  浏览/下载:20/0  |  提交时间:2018/07/30
Factors influencing the heavy metal bioaccessibility in soils were site dependent from different geographical locations SCI/SSCI论文  OAI收割
2015
作者:  
Zhu X. D.;  Yang, F.;  Wei, C. Y.
收藏  |  浏览/下载:163/0  |  提交时间:2015/12/09
The challenge of wide application of information and communication technologies to traditional location theory SCI/SSCI论文  OAI收割
2013
Song Z. Y.; Liu W. D.
收藏  |  浏览/下载:32/0  |  提交时间:2014/12/24
Active pixel sensor geometrical characteristic effects on star image subdivided locating accuracy for star tracker (EI CONFERENCE) 会议论文  OAI收割
ICO20: Remote Sensing and Infrared Devices and Systems, August 21, 2005 - August 26, 2005, Changchun, China
作者:  
Liu J.;  Liu J.;  Liu J.;  Li J.;  Li J.
收藏  |  浏览/下载:27/0  |  提交时间:2013/03/25
Active pixel sensor (APS) star tracker becomes an investigated hotspot because of its technical advantages. And centroid algorithm is a subpixel method proper to star position calculation because of its high accuracy and simplicity. When centroid algorithm is applied on APS star tracker  APS pixel geometrical characteristics might effect on star image position accuracy. Because the amplifier circuit and other function circuits inter pixel of APS take up some pixel area  the Fill Factor is less than 100%. Moreover  the active sensitive area has a certain geometrical shape  such as square  rectangle and L shape. The Fill Factor of pixel influences on star image subdivided locating accuracy when using centioid algorithm. In this paper  we have analyzed all pixel geometrical characteristics influence on the star position accuracy. From simulation experiments  we can conclude that Fill factor and pixel geometric shape influence on star position accuracy. The star locating error increased when Fill Factor decreased  and different geometrical shape of active sensitive area of pixel can make different influence on star location accuracy  the symmetrical sensitive area in x or y axis have symmetrical location error in the same axis.  
Key techniques of laser direct writing of fine lines on the spherical surface (EI CONFERENCE) 会议论文  OAI收割
ICO20: Optical Design and Fabrication, August 21, 2005 - August 26, 2005, Changchun, China
Liang F.; Hu J.
收藏  |  浏览/下载:21/0  |  提交时间:2013/03/25
The main principles of laser direct writing (LDW) system for lines on the spherical surface (SS) are discussed. It is pointed out that line profile is determined by the exposure dose distribution  which lies on the light intensity distribution of focus plane and the scanning speed. To improve the quality of line profile on the SS  several key techniques as follows are introduced. Firstly  the unique system configuration  four axes mutually intersecting at the center of the SS  is adopted  which ensures the shape of the focus be maintained circular during the writing period. Secondly  an automatic focus system (AFS) with the function of automatic focus in a certain range is introduced. Thirdly  to guarantee the linear velocity to accord with the exposure character of the photoresist all the time  an efficient arithmetic that controls motors run at appropriate angular velocity in different latitude is developed. Finally  to achieve a stable and well-behaved system so as to compensate the velocity instability resulting from unavoidable errors of mechanical and electronics factor  a powerful programmable multi-axis controller (PMAC) is utilized as the kernel element of the servocontrol system  and the curves of step response and parabolic response achieved by feedforward and PID loop tuning indicate that the location precision and velocity stability have reached a high level. The experimental results of LDW of lines on the SS work piece with a diameter 30 mm and a radius equal to 100 mm are given. The section analysis of the lines on the photoresist by the atomic force microscope (AFM) after exposure and development is performed. The results show that line width is about 3.0 m  and the steep sides of the lines are parallel to each other.  
Distribution and transcription activity of nucleolar DNA in higher plant cells 期刊论文  OAI收割
CELL BIOLOGY INTERNATIONAL, 2001, 卷号: 25, 期号: 11, 页码: 1167-1171
作者:  
Tao, W;  Xu, W;  Valdivia, MM;  Hao, S;  Zhai, ZH
  |  收藏  |  浏览/下载:19/0  |  提交时间:2011/08/22