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	Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography 期刊论文 OAI收割 j. micro-nanolithogr. mems moems, 2014, 卷号: 13, 期号: 3, 页码: 33007 作者: Liu, Xiaolei; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Erdmann, Andreas 收藏 \| 浏览/下载：26/0 \| 提交时间：2016/11/28 extreme ultraviolet lithography mask model shadowing effect pattern shift critical dimension bias
	Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography 期刊论文 OAI收割 j. micro-nanolithogr. mems moems, 2014, 卷号: 13, 期号: 3, 页码: 33007 作者: Liu, Xiaolei; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Erdmann, Andreas 收藏 \| 浏览/下载：20/0 \| 提交时间：2016/11/28 extreme ultraviolet lithography mask model shadowing effect pattern shift critical dimension bias
	基于听觉谱局域关联建模的语音分离方法研究学位论文 OAI收割工学博士, 中国科学院自动化研究所: 中国科学院大学, 2013 作者: 梁山收藏 \| 浏览/下载：238/0 \| 提交时间：2015/09/02 语音分离计算听觉场景分析邻域关联模型贝叶斯估计理想二值掩蔽理想浮值掩蔽 Speech separation Computational auditory scene analysis Local correlation model Bayes estimation Ideal binary mask Ideal ratio mask
	Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China Tan X. 收藏 \| 浏览/下载：24/0 \| 提交时间：2013/03/25 In ultraviolet spectroscopy groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order it is important to control the groove shape precisely so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method the required blaze angle is small we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides since the etched groove shape depends on the aspect ratio of the photoresist mask ridge if we wish to fabricate larger gratings with this method we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).