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A design of beam shaping unit for 193nm lithography illumination system using angular spectrum theory (EI CONFERENCE) 会议论文  OAI收割
6th International Symposium on Precision Engineering Measurements and Instrumentation, August 8, 2010 - August 11, 2010, Hangzhou, China
作者:  Zhao Y.;  Zhang W.;  Zhang W.;  Li S.;  Gong Y.
收藏  |  浏览/下载：19/0  |  提交时间：2013/03/25
Off-axis illumination (OAI) technology is widely used to enhance resolution for deep ultraviolet lithography. The realizing methods of OAI include geometrical optics method and physical optics method. However  the former has the disadvantage of weak intensity distribution controlling ability  and the latter introduces simulation errors evidently when dealing with near field diffraction propagation. A diffractive optical element (DOE) designing method using plane wave angular spectrum theory is presented in this paper. Several kinds of OAI modes at near field away from DOE can be realized  and simulation errors and the size of illuminator are also reduced. According to studying the relationships of the sampling point distance of DOE  light beam propagation distance  and the structure of the beam shaping unit  a method of determining the designing parameters is discussed. Using this method  several illumination modes are realized  and simulation results show that all diffraction efficiencies reach up to 84%. The method of DOE manufacturing is analyzed at last  and it is proven to be feasible. 2010 SPIE.  
Electro-optic modulation of light propagating near the optic axis with any polarization in uniaxial crystals 期刊论文  OAI收割
optik, 2006, 卷号: 117, 期号: 9, 页码: 418, 422
Song Zhe; 刘立人; 周煜u; 刘德安; Ren Haixia
收藏  |  浏览/下载：1520/292  |  提交时间：2009/09/18
入射光偏振方向对LiNbO3晶体近光轴电光调制的影响 期刊论文  OAI收割
中国激光, 2005, 卷号: 32, 期号: 3, 页码: 319, 322
宋哲; 刘立人; 周煜; 刘德安; 任海霞
收藏  |  浏览/下载：1497/258  |  提交时间：2009/09/18