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	Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China Tan X. 收藏 \| 浏览/下载：26/0 \| 提交时间：2013/03/25 In ultraviolet spectroscopy groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order it is important to control the groove shape precisely so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method the required blaze angle is small we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides since the etched groove shape depends on the aspect ratio of the photoresist mask ridge if we wish to fabricate larger gratings with this method we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
	Analysis of applying SBUVICCD to corona detection (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging 2007 - Laser, Ultraviolet, and Terahertz Technology, September 9, 2007 - September 12, 2007, Beijing, China 作者: Yan F.; Yang H.; Zhao Y.; Zhao Y.; Zhao Y. 收藏 \| 浏览/下载：26/0 \| 提交时间：2013/03/25 Using solar blind ultraviolet (SBUV) spectral light imaging technology to detect corona is a kind of advanced technology this time. Corona can be detected and imaged by using solar blind ultraviolet intensifier charge coupled device (SBUVICCD) without complex background to be processed. In this paper how to use ICCD to detect corona was analyzed. Imaging process of Gen II SBUVICCD was introduced and what will be noted during design instruments based on SBUVICCD to detect corona was also discussed. Some methods for deciding corona discharge level by using images from SBUVICCD were discussed sequentially. Finally some corona pictures taken by using SBUVICCD were shown and expressed to support the items mentioned above. The result shows that SBUVICCD is suitable for corona detection in site.
	FRACTIONALLY CHARGED COLOR SINGLET FERMIONS AND LOW MASS MAGNETIC MONOPOLES IN SU(9) GRAND UNIFIED MODELS 期刊论文 OAI收割 Science in China;Ser.A, 1983, 期号: 4, 页码: 1189-1197 作者: Dong FX(东方晓); Du DS(杜东生); Xue PY(薛丕友); Zhou XJ(周咸建) 收藏 \| 浏览/下载：11/0 \| 提交时间：2015/12/10 elegant ordinary accommodate fractional singlet noted charges generator broken exotic
	ON DETECTION OF NEUTRINOS IN THE UNIVERSE AND NEUTRINO STAR 期刊论文 OAI收割 A Monthly Journal of Science, 1982, 期号: 4, 页码: 389-392 作者: Qing CR(庆承瑞); Wu YS(吴詠时); He ZX(何祚庥); Zhang ZX(张肇西); Zou ZL(邹振隆) 收藏 \| 浏览/下载：22/0 \| 提交时间：2015/12/07 universe gravitational ultraviolet correspond luminosity extremely sorts esses 下尸 noted