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	A Startup Control Method for Plasma Lamps by Using Fractional-N Phase-Locked Loop Microwave Driver 期刊论文 OAI收割 ELECTRONICS, 2022, 卷号: 11 作者: Xu, Mengyao; Jia, Hua; Huan, Weiding; Shan, Jiafang \| 收藏 \| 浏览/下载：24/0 \| 提交时间：2022/12/23 RF source fractional-N PLL automatic control plasma light source
	Assessment of surface roughness by use of soft x-ray scattering (EI CONFERENCE) 会议论文 OAI收割 Soft X-Ray Lasers and Applications VIII, August 4, 2009 - August 6, 2009, San Diego, CA, United states Yan-li M.; Yong-gang W.; Shu-yan C.; Bo C. 收藏 \| 浏览/下载：29/0 \| 提交时间：2013/03/25 A soft x-ray reflectometer with laser produced plasma source has been designed which can work from wavelength 8nm to 30 nm and has high performance. Using the soft x-ray reflectometer above the scattering light distribution of silicon and zerodur mirrors which have super-smooth surfaces could be measured at different incidence angle and different wavelength. The measurement when the incidence angle is 2 degree and the wavelength is 1 lnm has been given in this paper. A surface scattering theory of soft x-ray grazing incidence optics based on linear system theory and an inverse scattering mathematical model is introduced. The vector scattering theory of soft x-ray scattering also is stated in detail. The scattering data are analyzed by both the methods above respectively to give information about the surface profiles. On the other hand both the two samples are measured by WYKO surface profiler and the surface roughness of the silicon and zerodur mirror is 1.3 nm and 1.5nm respectively. The calculated results are in quantitative agreement with those measured by WYKO surface profiler which indicates that soft x-ray scattering is a very useful tool for the evaluation of highly polished surfaces. But there still some difference among the results of different theory and WYKO and the possible reasons of such difference have been discussed in detail. 2009 SPIE.
	Production of EUV power with SECRAL 会议论文 OAI收割作者: Zhao, Huan-Yu; Zhao, Hong-Wei; Sun, Liang-Ting; Zhang, Xue-Zhen; Sheng, Liu-Si \| 收藏 \| 浏览/下载：14/0 \| 提交时间：2018/08/20 EUV light source ECR plasma EUV power
	Production of EUV power with SECRAL 会议论文 OAI收割作者: Zhao, Huan-Yu; Zhao, Hong-Wei; Sun, Liang-Ting; Zhang, Xue-Zhen; Sheng, Liu-Si \| 收藏 \| 浏览/下载：24/0 \| 提交时间：2018/08/20 EUV light source ECR plasma EUV power
	Production of EUV power with SECRAL 期刊论文 OAI收割 HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION, 2007, 卷号: 31, 期号: Suppl, 页码: 229-231 作者: Zhao, Huan-Yu; Zhao, Hong-Wei; Sun, Liang-Ting; Zhang, Xue-Zhen; Sheng, Liu-Si \| 收藏 \| 浏览/下载：21/0 \| 提交时间：2010/10/29 EUV light source ECR plasma EUV power