中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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Calculating model for equivalent thermal defocus amount in infrared imaging system 期刊论文  OAI收割
Infrared Physics and Technology, 2016, 卷号: 74, 页码: 72-80
作者:  
Zhang CS(张程硕);  Shi ZL(史泽林);  Xu BS(徐保树);  Feng B(冯斌)
收藏  |  浏览/下载:38/0  |  提交时间:2016/01/30
Infrared lens thermal effect: equivalent focal shift and calculating model 会议论文  OAI收割
International Symposium on Optoelectronic Technology and Application 2014, Beijing, China, May 13-15, 2014
作者:  
Zhang CS(张程硕);  Shi ZL(史泽林);  Feng B(冯斌);  Xu BS(徐保树)
收藏  |  浏览/下载:45/0  |  提交时间:2014/12/29
Thermal difference analysis and athermalization design of infrared optical system (EI CONFERENCE) 会议论文  OAI收割
Optical Design and Testing IV, October 18, 2010 - October 20, 2010, Beijing, China
作者:  
Zhang X.;  Zhang X.;  Zhang X.
收藏  |  浏览/下载:32/0  |  提交时间:2013/03/25
When infrared optical system works in a large temperature range  the thermal effect of optical lens and optical tube will produce image plane shift and lead to imaging quality deterioration. In order to eliminate the thermal aberration  the athermalization design principles of infrared optical system were introduced  and some commonly used methods of thermal difference compensation were described. Proceeding from single lens  the thermal difference caused by temperature changing was analyzed  and the relationship between temperature and focus shift was obtained. Considering optical tube thermal expansion  a set of equations to estimate the thermal difference of lens group was given. Finally  an infrared optical imaging system that can work under the temperature range of -40C to 60C was design according to athermal technique  in which a new mechanical passive temperature compensation was proposed. Through simulation  the athermalization design could make imaging plane shift the smallest. The simulation results coincided with the theoretical formula  and the design had reference value in engineering. 2010 Copyright SPIE - The International Society for Optical Engineering.  
Athermal design of hybrid refractive/harmonic diffractive optical system for far-infrared multi-band (EI CONFERENCE) 会议论文  OAI收割
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, November 19, 2008 - November 21, 2008, Chengdu, China
作者:  
Liu Y.;  Liu Y.;  Zhang H.;  Zhang H.;  Sun Q.
收藏  |  浏览/下载:31/0  |  提交时间:2013/03/25
In order to get enough information about the target  avoid big chromatic aberration as a result of wide spectrum and the complexity of optical system and adapt different special environment temperature  a hybrid refractive/harmonic diffractive optical system in far-infrared multi-band is described in the paper. This diffractive optical system has been designed an athermalized multi-band imaging system with harmonic diffractive element in 15-50m spectrum  based on larger 1dispersion capability and particular thermal dispersive power of harmonic diffractive element. Then  at the temperature range from 0C to 40C  this design can simultaneously meet with all requirements of the imaging system in five harmonic wave bands  including15.8-16.2m  18.5-20m  23-25m  30.5-33.5m and 46-50m. In each harmonic wave band  the magnification changes as a function of wavelength  which creates image registration error. To compensate this shortcoming  a zoom optical system is designed with three lenses by means of optical two- component method. The design results show that the hybrid refractive/harmonic diffractive optical system can realize athermalized and achromatic design  and the zoom optical system makes half image height at 3.53mm in every harmonic wave band and still realizes aberration compensation action. In the five harmonic wave bands  each optical transfer function approaches the diffraction limit at ambient temperature range of 0C to 40C. Finally  the system realizes the requirements of portability  mini-type and ease for fabrication. 2009 SPIE.  
侧面抽运板条激光介质动态热畸变测量方法 期刊论文  OAI收割
中国激光, 2007, 卷号: 34, 期号: 4, 页码: 511, 514
刘佳; 付文强; 胡企铨
收藏  |  浏览/下载:1463/221  |  提交时间:2009/09/18
Study on LD-pumped Nd:YAG laser cutter (EI CONFERENCE) 会议论文  OAI收割
ICO20: Lasers and Laser Technologies, August 21, 2005 - August 26, 2005, Changchun, China
作者:  
Zhang G.;  Zhang G.;  Zhang G.;  Zhang J.;  Zhang J.
收藏  |  浏览/下载:23/0  |  提交时间:2013/03/25
The theory of laser cutter and the technology neck is analyzed. We can conclude that it is almost impossible to deal with the waste thick silicon wafers which are yielded in producing silicon wafers by conventional eroding or diamond cutting  when the cutting velocity equals 100mm/min  while it is also unperfected with ecumenical laser cutter without good beam quality or precise laseroptics system. It is represented that high average power and high repetition rate laser with good beam quality and precise laseroptics system are pivotal to obtain excellent cutting effect such as thick groove depth  double-layer 0.75mm thick silicon wafer can be penetrated.. The cross section is fine and the groove is narrow  rapid cutting speed  the cutting quality meets the expecting demand.  fine kerf section without considering the effect of technique. Considering laser medium thermal lens effect and thermal focal length changing with pumping power  using plano-convex high reflectivity mirror as the back cavity mirror to compensate the heat lens influence  a /4 waveplate to compensate heat -induced birefraction  utilize the Nd:YAG self- aperture effect  more than 50 W average power 1.064 um IR output is obtained with beam quality factor (M2) equals 3.19. Through the LD-Pumped Nd:YAG laser cutter we developed with short focus length negative spherical aberration focusing lens  double axis linear step motor positioning system  suitable beam expander multiplying factor  appropriate diameter of exit beam aperture  proper repetition rate  when the cutting velocity equals 400mm/min  0.75mm thick silicon wafer can be penetrated