机构

• 光电技术研究所 [2]

采集方式

• OAI收割 [2]

内容类型

• 会议论文 [2]

发表日期

• 2014 [1]
• 2012 [1]

学科主题

• Bar codes ... [1]

筛选

浏览/检索结果: 共2条，第1-2条 帮助 限定条件 专题：光电技术研究所    第一署名单位    第一作者单位    通讯作者单位     条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Research development of thermal aberration in 193nm lithography exposure system 会议论文  OAI收割 Proceedings of SPIE: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design Manufacturing, and Testing of Micro- and Nano-Optical Devices, and Systems, 2014 作者:  Wang, Yueqiang;  Liu, Yong 收藏  |   Technology of focus detection for 193nm projection lithographic tool 会议论文  OAI收割 Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 2012 作者:  Di, Chengliang;  Yan, Wei;  Hu, Song;  Xu, Feng;  Li, Jinglong 收藏  |