An asymmetric PI hysteresis model for piezoceramics in nanoscale AFM imaging
文献类型:会议论文
作者 | Wang D(王栋); Dong ZL(董再励)![]() ![]() ![]() ![]() |
出版日期 | 2011 |
会议名称 | 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011 |
会议日期 | February 20-23, 2011 |
会议地点 | Kaohsiung, Taiwan |
关键词 | Nanostructured materials Nanotechnology Piezoelectric actuators Standards |
页码 | 1075-1079 |
中文摘要 | A modified Prandtl-Ishlinskii (PI) model, referred to as an asymmetric PI model, is implemented to reduce the displacement error between the model and the actual trajectory of a piezoceramic actuator used for AFM-based nanoscale imaging. The fact that the standard PI model is symmetric, while the actual hysteresis loop of a piezoceramic actuator is asymmetric, assures scanning errors if the standard PI operator is used. In order to improve the accuracy of the model, instead of using the same slope values in the entire PI model, different slope values to describe the forward loop (voltage increase) and the backward loop (voltage decrease) is proposed. The accuracy of the asymmetric PI model is validated on a custom-built AFM by comparing the experimental results derived from it with the results for the standard PI model. |
收录类别 | EI |
产权排序 | 1 |
会议主办者 | Institute of Electrical and Electronics Engineers (IEEE); IEEE Nanotechnology Council (NTC); National Cheng Kung University; National Tsing Hua University; Chinese International NEMS Socity (CINS) |
会议录 | NEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems
![]() |
会议录出版者 | IEEE Computer Society |
会议录出版地 | Piscataway, NJ |
语种 | 英语 |
ISBN号 | 978-1-61284-775-7 |
源URL | [http://ir.sia.cn/handle/173321/8561] ![]() |
专题 | 沈阳自动化研究所_机器人学研究室 |
推荐引用方式 GB/T 7714 | Wang D,Dong ZL,Jiao ND,et al. An asymmetric PI hysteresis model for piezoceramics in nanoscale AFM imaging[C]. 见:6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011. Kaohsiung, Taiwan. February 20-23, 2011. |
入库方式: OAI收割
来源:沈阳自动化研究所
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。