Nanochannels on silicon oxide surface fabricated by atomic force microscopy
文献类型：会议论文
| 作者 | Wang ZQ(王志迁); Tung, Steve; Jiao ND(焦念东) ; Dong ZL(董再励)
|
| 出版日期 | 2010 |
| 会议名称 | 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 |
| 会议日期 | January 20-23, 2010 |
| 会议地点 | Xiamen, China |
| 关键词 | Atomic force microscopy Nanolithography NEMS Silica Silicon oxides |
| 页码 | 637-640 |
| 中文摘要 | An experimental study was conducted to investigate the feasibility of fabricating relatively long nanochannels on hard and brittle silicon dioxide surface using atomic force microscopy (AFM) based lithography. Specifically, the relationship between the applied AFM tip force and the resultant nanochannel depth was measured and analyzed. The nanochannels were fabricated by two different AFM lithographic methods. In the first method, a constant tip force was applied and the maximum channel depth achievable was about 15nm. In the second method, a gradually increasing tip force was used and a much larger channel depth of 28nm was achieved. The average depth along the entire channel length was about 15nm. Based on the current results, it can be concluded that AFM based lithography is a viable nanomachining technique for realizing long nanochannels on silicon based substrates. |
| 收录类别 | EI |
| 产权排序 | 1 |
| 会议录 | 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
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| 会议录出版者 | IEEE Computer Society |
| 会议录出版地 | Piscataway, NJ |
| 语种 | 英语 |
| ISBN号 | 978-1-4244-6543-9 |
| 源URL | [http://ir.sia.cn/handle/173321/8799]  |
| 专题 | 沈阳自动化研究所_机器人学研究室 |
| 推荐引用方式 GB/T 7714 | Wang ZQ,Tung, Steve,Jiao ND,et al. Nanochannels on silicon oxide surface fabricated by atomic force microscopy[C]. 见:5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. Xiamen, China. January 20-23, 2010. |
入库方式： OAI收割
来源：沈阳自动化研究所
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