中国科学院机构知识库网格系统: 检索

中国科学院机构知识库网格

Chinese Academy of Sciences Institutional Repositories Grid

机构

采集方式

内容类型

发表日期

学科主题

筛选

浏览/检索结果: 共3条，第1-3条

帮助

条数/页：排序方式：
	Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism 期刊论文 OAI收割 APPLIED SURFACE SCIENCE, 2025, 卷号: 679 作者: Zhu, Xiaoxiao; Ding, Juxuan; Mo, Zhangchao; Jiang, Xuesong; Sun, Jifei \| 收藏 \| 浏览/下载：4/0 \| 提交时间：2024/11/20 Chemical mechanical polishing (CMP) Ceria abrasive Diamond abrasive Interfacial chemical reaction Material removal mechanism
	Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives 期刊论文 OAI收割 TRIBOLOGY INTERNATIONAL, 2024, 卷号: 197 作者: Zhu, Xiaoxiao; Gui, Yuziyu; Fu, Hao; Ding, Juxuan; Mo, Zhangchao \| 收藏 \| 浏览/下载：7/0 \| 提交时间：2024/11/20 Silicon carbide (SiC) Photocatalytic-assisted chemical mechanical polishing (PCMP) Core/shell abrasives Materials removal mechanism
	Enhancing P removal from primary Si by P-containing Al2Si2Sr phase during Al-Si solvent refining 期刊论文 OAI收割 MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2022, 卷号: 147 作者: Chen, Chen; Li, Jingwei; Song, Wangfeng; Jiang, Xuesong; Ding, Juxuan \| 收藏 \| 浏览/下载：38/0 \| 提交时间：2022/12/23 Al-Si alloy Solvent refining Al2Si2Sr phase First-principle calculation