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一种制备α-Fe2O3纳米球的方法 专利  OAI收割
专利类型: 发明, 专利号: CN201210323134.8, 申请日期: 2013-05-01, 公开日期: 2013-05-01
作者:  
邢荣娥;  于华华;  李鹏程;  秦玉坤
收藏  |  浏览/下载:47/0  |  提交时间:2014/08/04
Effects of surface roughness and film thickness on the adhesion of a bioinspired nanofilm 期刊论文  OAI收割
Physical Review E, 2011, 卷号: 83, 期号: 5, 页码: 51915
作者:  
Peng ZL(彭志龙);  Chen SH(陈少华)
收藏  |  浏览/下载:31/0  |  提交时间:2012/04/01
Manufacturing and testing of the line-array fiber-optic image slicer based on silicon V-grooves (EI CONFERENCE) 会议论文  OAI收割
MEMS/MOEMS Technologies and Applications III, November 12, 2007 - November 14, 2007, Beijing, China
作者:  
Zhu Y.
收藏  |  浏览/下载:29/0  |  提交时间:2013/03/25
Linear fiber-optic image slicer is used more and more in spatial exploration and imaging system. In this paper  a plane arranging method of fiber-optic array based on Si-V grooves is established in order to improve the accuracy and reduce the cost of manufacturing. Firstly  the Si-V groove array is micro-machined with anisotropic etching process  then optical fibers are placed in the grooves orderly with plane arranging method. Secondly  the end surfaces of the device are polished  also the linear fiber-optic image slicer is packaged. Finally  some parameters are tested  including structure parameters  transmittivity and vibration test. Experimental results indicate that the maximum error accumulated in 2000 periods of the Si-V grooves is 0.5 m  the error of the height in Si-V grooves is less than 0.15m  the roughness of the end surface is less than 0.9nm. The transmittivity of the linear fiber-optic image slicer that without optical film is 51.46% at the wavelength of 632.8nm. After random vibration experiment  the ratio of the broken fiber increased by 0.1%. While the temperature reached 320C  the stress of epoxy will be 130Mpa  which is close to the limit resistance stress of 139Mpa  some cracks appeared.  
Characteristics of ZnMgO-based metal-semiconductor-metal photodetectors (EI CONFERENCE) 会议论文  OAI收割
International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Photoelectronic Imaging and Detection, September 9, 2007 - September 12, 2007, Beijing, China
作者:  
Zhang J.;  Li B.;  Li B.;  Li B.;  Zhao Y.
收藏  |  浏览/下载:25/0  |  提交时间:2013/03/25
In recent years  ZnMgO semiconductor alloys  with a direct bandgap tunable between 3.37 eV and 7.8 eV  become one of the most suitable materials for the fabrication of ultraviolet detectors. In this paper  we have fabricated metal-semiconductor-metal photodetectors on 1-m thick Zn 0.8Mg0.2O films. The interdigital metal electrodes are 500 m long and 5 m wide with an interelectrode spacing 2 m  5 m and 10 m  respectively. Zn0.8Mg0.2O films were grown on quartz by ratio frequency magnetron sputtering at 500C. Dark current  spectral responsivity and pulse response were carried out for the devices with different finger pitches. All the photodetectors showed the peak responsivity at 330 nm and the ultraviolet-visible rejection ratio (R330 nm/R400 nm) is more than four orders of magnitude at 3 V bias. For the device with 2 m finger pitch  the detectivity was calculated as 4.21011 cm Hz 1/2/W at 330 nm. Furthermore  the transient response measurement for all devices revealed similar rise time of 10 ns. The 90%-10% fall times are 130 ns  170 ns and 230 ns for the devices with different finger pitches of 2 m  5 m and 10 m  respectively..