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An Image-Based Alignment Errors Correction Method for Segmented Fresnel Primary Mirror 期刊论文  OAI收割
IEEE Photonics Journal, 2020, 卷号: 12, 期号: 2, 页码: 6900614-1-14
作者:  
Zhu, Licheng;  Yang, Ping;  Wen, Lianghua;  Zhao, Lujia;  Guan, Chunlin
  |  收藏  |  浏览/下载:28/0  |  提交时间:2021/05/11
Telescopes Alignment Using the Sharpness Function Method Based on Undersampled Images 期刊论文  OAI收割
IEEE Photonics Journal, 2019, 卷号: 11, 期号: 1
作者:  
Li, Min;  Liu, Xin;  Zhang, Ang;  Xian, Hao
  |  收藏  |  浏览/下载:13/0  |  提交时间:2021/05/06
Effects of mask-alignment error on point spread function for multi-level Fresnel diffractive lenses 期刊论文  OAI收割
CHINESE OPTICS LETTERS, 2018, 卷号: 16, 期号: 9, 页码: 90501
作者:  
Liu, Dun;  Wu, Shibin;  Yang, Wei;  Wang, Lihua;  Fan, Bin
  |  收藏  |  浏览/下载:43/0  |  提交时间:2019/08/23
Application of improved UKF algorithm in initial alignment of SINS (EI CONFERENCE) 会议论文  OAI收割
2011 2nd International Conference on Artificial Intelligence, Management Science and Electronic Commerce, AIMSEC 2011, August 8, 2011 - August 10, 2011, Zhengzhou, China
Su W. X.
收藏  |  浏览/下载:21/0  |  提交时间:2013/03/25
The effect on tolerance distributing of an off-axis three mirror anastigmatic optical system with wavefront coding technology (EI CONFERENCE) 会议论文  OAI收割
Optical System Alignment and Tolerancing II, August 10, 2008 - August 11, 2008, San Diego, CA, United states
作者:  
Yan F.;  Zhang X.-J.;  Yan F.
收藏  |  浏览/下载:35/0  |  提交时间:2013/03/25
The wavefront coding technology is known as a system-level technology which can extend the depth of focus of optical system by innovative optical design and image restoration. This technology can control misfocus related aberrations including misfocus  astigmatism  and Petzval curvature  temperature-related misfocus in digital imaging systems. It can also help optical system tolerate more residual error in optical manufacturing and alignment besides misfocus. The brief introduction of wavefront coding technology and the wavefront coded TMA system under research is presented respectively in part 1 and part 2. The "MTF similarity" is defined to describe the relationship among MTF at different position or different fields in the third part. It is also shown in this part that the MTF similarity of wavefront coded system is much higher than the normal system within a large range. In part 4 comparison between the origin system and the new system with wavefront coding technology is provided after multiple errors are introduced  from which it can be observed that the system with wavefront coding technology can tolerate much bigger error than origin system. The error tolerance is re-distributed according to a new criterion based on MTF similarity. If the MTF similarity is less than a certain value  it can be regarded that the system can tolerate the residual error. The new error tolerance is displayed and it is shown that the wavefront coding technology can also loosen the error distributing besides extended the depth of focus.  
Key techniques of laser direct writing patterns on spherical substrate (EI CONFERENCE) 会议论文  OAI收割
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
作者:  
Zhao J.-L.;  Feng X.-G.
收藏  |  浏览/下载:24/0  |  提交时间:2013/03/25
Comparing with the writing method of plane pattern  spherical pattern' has some remarkable different on several points. Firstly  it is difficult to spin-coated a uniform photoresist film on a spherical substrate  especially the ratio of spherical radius to caliber is smaller  and the spin-coated way must match the ratio of spherical radius to caliber. Secondly  if the sphere couldn't be regarded as a plane  a so-called concentric optical scan movement way must be applied for the generation of spherical pattern  because the reflex of substrate will affect the quantity of illumination. Commonly  an alignment technique is indispensable with pattern generation of spherical surface by the concentric optical scan in order to ensure the orthogonal intersection of focusing laser beam and writing surface. Thirdly  a uniform velocity control must be considered for the laser direct writing method on a spherical substrate. Otherwise  the exposure time of photoresist will be different  and the line widths of pattern will be also different at different areas. Fourthly  commonly  because the errors of concentric machine and substrate surface shape are bigger  so focusing servo-control technique is also needful for writing a pattern on a spherical substrate. Focusing servo-control may keep the focal spot on the spherical surface by a focus detection and control system in the course of writing pattern. Using these techniques  we fabricated a line width of 7m and a period of 600m isometric mesh on the concave of a spherical substrate.  
拼接光栅压缩器的时域特性 期刊论文  OAI收割
光学学报, 2007, 卷号: 27, 期号: 4, 页码: 701, 705
马雪梅; 戴亚平; 朱健强
收藏  |  浏览/下载:1732/335  |  提交时间:2009/09/18