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浏览/检索结果: 共8条,第1-8条 帮助

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Strategies for high-performance perovskite solar cells from materials, film engineering to carrier dynamics and photon management 期刊论文  OAI收割
INFOMAT, 2022
作者:  
Li, Huilin;  Chen, Chong;  Hu, Hangyu;  Li, Yu;  Shen, Zhitao
  |  收藏  |  浏览/下载:44/0  |  提交时间:2022/12/23
Introduction of 4-hydroxybenzaldehyde as interface modifier with multidimensional defects passivation effect for high-performance perovskite solar cells 期刊论文  OAI收割
APPLIED SURFACE SCIENCE, 2021, 卷号: 570
作者:  
Wu, Weiwei;  Xu, Huifen;  Liu, Guozhen;  Zheng, Haiying;  Pan, Xu
  |  收藏  |  浏览/下载:85/0  |  提交时间:2022/01/10
Anchoring CsPbI3 crystalline for stable and efficient perovskite solar cells with perfluorocarbon-assisted shield 期刊论文  OAI收割
SOLAR ENERGY, 2021, 卷号: 228
作者:  
Zhang, Liying;  Liu, Boyuan;  Xu, Xiaoxiao;  Xu, Shendong;  Du, Du
  |  收藏  |  浏览/下载:47/0  |  提交时间:2022/01/10
Efficient and Stable Inverted Perovskite Solar Cells Incorporating Secondary Amines 期刊论文  OAI收割
ADVANCED MATERIALS, 2019, 卷号: 31, 期号: 46
作者:  
Chen, Hao;  Wei, Qi;  Saidaminov, Makhsud, I;  Wang, Fei;  Johnston, Andrew
  |  收藏  |  浏览/下载:153/0  |  提交时间:2019/12/31
The structure properties, defect stability and excess properties in Am-doped LnPO(4) (Ln = La, Ce, Nd, Sm, Eu, Gd) monazites 期刊论文  OAI收割
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 806, 页码: 113-119
作者:  
Teng, Yuancheng;  Yang, Xiaoyong;  Wu, Lang;  Wang, Lili;  Zhang, Tongmin
  |  收藏  |  浏览/下载:93/0  |  提交时间:2019/11/10
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE) 会议论文  OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.; Gao W.; Liao Y.; Jing H.; Fu G.
收藏  |  浏览/下载:24/0  |  提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress  it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping  a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper  controlling different flow ratio of source gas SiH4 and NH3  and a great deal of tests (ellipsometer  infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators  three different capacitance samples in MIS structure were done  degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation  this result indicated that the defect density of this type SiN x was smaller  and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT  SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.  
Laser conditioning of ZrO2 : Y2O3/SiO2 mirror coatings prepared by E-beam evaporation 期刊论文  OAI收割
appl. surf. sci., 2005, 卷号: 239, 期号: 2, 页码: 171, 175
Zhao YN; Wang T; Zhang DP; Fan SH; 邵建达; 范正修
收藏  |  浏览/下载:1013/165  |  提交时间:2009/09/22
A study of the passive films on chromium by capacitance measurement 期刊论文  OAI收割
Corrosion Science, 2003, 卷号: 45, 期号: 4, 页码: 747-758
D. S. Kong; S. H. Chen; C. Wang; W. Yang
收藏  |  浏览/下载:14/0  |  提交时间:2012/04/14