中国科学院机构知识库网格系统: 检索

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	Modeling multilayer coating profiles with defects on EUV collector with grating 期刊论文 OAI收割 Optical Engineering, 2019, 卷号: 58, 期号: 10, 页码: 9 作者: S.Z.Sun; C.S.Jin; B.Yu; T.Guo; S.Yao \| 收藏 \| 浏览/下载：28/0 \| 提交时间：2020/08/24 EUV collector with grating,multilayer coating profile,coating defects,deposition model,EUV reflectance,lithography,Optics
	Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography 期刊论文 OAI收割 MACROMOLECULAR MATERIALS AND ENGINEERING, 2018, 卷号: 303, 期号: 6 作者: Peng, Xiaoman; Wang, Yafei; Xu, Jian; Yuan, Hua; Wang, Liangqian \| 收藏 \| 浏览/下载：38/0 \| 提交时间：2019/04/09 Euv Lithography Molecular Glasses Photoresists
	Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons 期刊论文 OAI收割 Optics Express, 2017, 卷号: 25, 期号: 17, 页码: 20511-20521 作者: Liu, Hongchao; Kong, Weijie; Liu, Kaipeng; Zhao, Chengwei; Du, Wenjuan \| 收藏 \| 浏览/下载：30/0 \| 提交时间：2018/11/20 HIGH-ASPECT-RATIO PHOTONIC CRYSTALS EUV LITHOGRAPHY FABRICATION DIFFRACTION NANOLITHOGRAPHY EXTREME
	Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility 期刊论文 OAI收割 MICROELECTRONIC ENGINEERING, 2016, 卷号: 155, 页码: 55-60 作者: Fan, D; Buitrago, E; Yang, SM; Karim, W; Wu, YQ 收藏 \| 浏览/下载：16/0 \| 提交时间：2017/03/02 EUV Interference lithography High resolution Nano-lithography Achromatic Talbot lithography