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Chinese Academy of Sciences Institutional Repositories Grid
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A RF plasma source with focused magnetic field for material treatment 期刊论文  OAI收割
PLASMA CHEMISTRY AND PLASMA PROCESSING, 2022
作者:  
Zhang, L. P.;  Chang, L.;  Yuan, X. G.;  Zhang, J. H.;  Zhou, H. S.
  |  收藏  |  浏览/下载:52/0  |  提交时间:2022/12/23
Applying the plasma physical sputtering process to SRF cavity treatment: Simulation and Experiment Study 期刊论文  OAI收割
APPLIED SURFACE SCIENCE, 2022, 卷号: 574, 页码: 10
作者:  
Zhu, Tongtong;  Luo, Didi;  Wu, Andong;  Tan, Teng;  Guo, Hao
  |  收藏  |  浏览/下载:103/0  |  提交时间:2022/01/12