中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
首页
机构
成果
学者
登录
注册
登陆
×
验证码:
换一张
忘记密码?
记住我
×
校外用户登录
CAS IR Grid
机构
长春光学精密机械与物... [1]
西安光学精密机械研究... [1]
采集方式
OAI收割 [2]
内容类型
会议论文 [1]
期刊论文 [1]
发表日期
2005 [2]
学科主题
筛选
浏览/检索结果:
共2条,第1-2条
帮助
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
题名升序
题名降序
提交时间升序
提交时间降序
作者升序
作者降序
发表日期升序
发表日期降序
Preparation and characteristics of the wide gap semiconductor Mg0.18Zn0.82O thin film by L-MBE
期刊论文
OAI收割
microelectronics journal, 2005, 卷号: 36, 期号: 2, 页码: 125-128
作者:
He, YN
;
Zhang, JW
;
Yang, XD
;
Xu, QA
;
Liu, XH
收藏
  |  
浏览/下载:24/0
  |  
提交时间:2015/08/17
MgZnO alloy thin film
ZnO thin film
L-MBE
ceramic target
Characterization of ZnO/Mg0.12Zn0.88O heterostructure grown by plasma-assisted molecular beam epitaxy (EI CONFERENCE)
会议论文
OAI收割
13th International Conference on Molecular Beam Epitaxy, August 22, 2004 - August 27, 2004, 13th International Conference on Molecular Beam Epitaxy, August 22, 2004 - August 27, 2004
Lu Y. M.
;
Wu C. X.
;
Wei Z. P.
;
Zhang Z. Z.
;
Zhao D. X.
;
Zhang J. Y.
;
Liu Y. C.
;
Shen D. Z.
;
Fan X. W.
收藏
  |  
浏览/下载:28/0
  |  
提交时间:2013/03/25
In this paper
Mg0.12Zn0.88O/ZnO heterostructures were fabricated on c-plane sapphire (Al2O3) substrates by plasma-assisted molecular beam epitaxy (P-MBE). The quality of the Mg 0.12Zn0.88O alloy thin film was characterized by X-ray diffraction (XRD) and reflection high-energy electron diffraction (RHEED). Optical properties of the Mg0.12Zn0.88O/ZnO heterostructure were studied by absorption and photoluminescence (PL) spectra. At room temperature (RT)
Mg0.12Zn0.88O/ZnO heterostructures show two absorption edges originating from ZnO and Mg 0.12Zn0.88O layers
respectively. In PL spectra
two ultraviolet emission bands related to the ZnO layer and the Mg 0.12Zn0.88O layer were observed. The emission band from Mg0.12Zn0.88O layer dominates at moderately lower temperature
and the luminescence of ZnO becomes gradually important with increasing temperature. This is suggested to exist as a potential barrier in the interface and to restrict the relaxation of the carriers from the Mg 0.12Zn0.88O layer to ZnO layer. As the thickness of ZnO layer decreases
the emission from the Mg0.12Zn0.88O layer becomes weaker and weaker. When the ZnO thickness is up to 2 nm
only the luminescence of the ZnO layer is observed at RT. The quenching of the emission corresponding to the MgZnO layer indicates the existence of a strong injection process in the samples with thinner ZnO layer. 2005 Elsevier B.V. All rights reserved.