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CAS IR Grid
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苏州纳米技术与纳米仿... [1]
长春光学精密机械与物... [1]
上海微系统与信息技术... [1]
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期刊论文 [2]
会议论文 [1]
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2015 [1]
2007 [1]
2006 [1]
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Engineerin... [1]
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Micro-electro-mechanical systems capacitive ultrasonic transducer with a higher electromechanical coupling coefficient
期刊论文
OAI收割
Micro & Nano Letters, 2015, 卷号: 10, 期号: 10, 页码: 4
作者:
Miao, J(苗静)
;
Shen, WJ(沈文江)
;
He, CD
;
Xue, CY
;
Xiong, JJ
收藏
  |  
浏览/下载:88/0
  |  
提交时间:2015/12/31
silicon
elemental semiconductors
silicon-on-insulator
wafer bonding
electromechanical effects
ultrasonic transducers
capacitive transducers
micromechanical devices
micromachining
vibrations
membranes
finite element analysis
reliability
capacitance
electromechanical coupling coefficient
capacitive micromachined ultrasonic transducer
impedance matching
propagation medium
microelectromechanical system capacitive ultrasonic transducer
silicon on insulator
wafer bonding
optimum geometric dimensions
membrane mechanical vibration
electrical characteristics
finite-element analysis
operation mode
device safety
device reliability
equivalent stress
operation-collapse voltage
bottom electrodes
glass substrate surface
parallel parasitic capacitance
Si
SiO2
The fabrication and study of ZnO-based thin film transistors (EI CONFERENCE)
会议论文
OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
作者:
Wang C.
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  |  
浏览/下载:23/0
  |  
提交时间:2013/03/25
Bottom-gate-type thin film transistors using ZnO as an active channel layer (ZnO-TF-TS) have been constructed. The ZnO layers were deposited using metal organic chemical vapor deposition (MOCVD)[1-3] at about 360C. SiO2 was used as the material of gate insulator to suppress the leakage current effectively and to enable the ZnO-TFT to operate successfully. The drain current on-to-off ratio of ZnO-TFTs fabricated on the substrate of glass is about 104. The average optical transmission of ZnO-TFTs in the visible portion is 80%. All above shows that it is possible to fabricate a transparent TFT using ZnO as an active channel layer instead of the traditional Si material.
Nanofabrication based on MEMS technology
期刊论文
OAI收割
IEEE SENSORS JOURNAL, 2006, 卷号: 6, 期号: 3, 页码: 686-690
Wang, YL
;
Li, XX
;
Li, T
;
Yang, H
;
Jiao, JW
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  |  
浏览/下载:11/0
  |  
提交时间:2011/11/08
ON-INSULATOR SUBSTRATE
IMPRINT LITHOGRAPHY
ROOM-TEMPERATURE
SILICON
FABRICATION
SI
RESONATORS
RESOLUTION
OPERATION
FILMS