中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
首页
机构
成果
学者
登录
注册
登陆
×
验证码:
换一张
忘记密码?
记住我
×
校外用户登录
CAS IR Grid
机构
长春光学精密机械与物... [2]
金属研究所 [1]
上海光学精密机械研究... [1]
采集方式
OAI收割 [4]
内容类型
会议论文 [2]
期刊论文 [2]
发表日期
2017 [1]
2007 [1]
2005 [2]
学科主题
Materials ... [1]
Metallurgy... [1]
光栅 [1]
筛选
浏览/检索结果:
共4条,第1-4条
帮助
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
题名升序
题名降序
发表日期升序
发表日期降序
提交时间升序
提交时间降序
作者升序
作者降序
Dependence of dislocation structure on orientation and slip systems in highly oriented nanotwinned Cu
期刊论文
OAI收割
ACTA MATERIALIA, 2017, 卷号: 127, 页码: 85-97
Lu, Qiuhong
;
You, Zesheng
;
Huang, Xiaoxu
;
Hansen, Niels
;
Lu, Lei
收藏
  |  
浏览/下载:59/0
  |  
提交时间:2017/08/17
Nanotwinned Cu
Slip system
Dislocation structure
TEM
Two-beam diffraction
超短脉冲激光光束被局域体全息光栅衍射的性质分析
期刊论文
OAI收割
光学学报, 2007, 卷号: 27, 期号: 9, 页码: 1558, 1564
王春花
;
刘立人
;
闫爱民
;
刘德安
;
周煜
收藏
  |  
浏览/下载:1248/213
  |  
提交时间:2009/09/18
衍射与光栅
diffraction and gratings
局域体全息
local volume hologram
超短脉冲激光光束
ultra-short pulsed beam
二维耦合波理论
two-dimensional coupled-wave theory
衍射效率
diffraction efficiency
Investigation of growth mode in ZnO thin films prepared at different temperature by plasma-molecular beam epitaxy (EI CONFERENCE)
会议论文
OAI收割
13th International Conference on Molecular Beam Epitaxy, August 22, 2004 - August 27, 2004, 13th International Conference on Molecular Beam Epitaxy, August 22, 2004 - August 27, 2004
Liang H. W.
;
Lu Y. M.
;
Shen D. Z.
;
Yan J. F.
;
Li B. H.
;
Zhang J. Y.
;
Liu Y. C.
;
Fan X. W.
收藏
  |  
浏览/下载:43/0
  |  
提交时间:2013/03/25
High-quality ZnO thin films on c-plane sapphire (Al2O 3) substrates were prepared by plasma-molecular beam epitaxy (P-MBE). The influence of growth temperature on growth mode of ZnO was investigated. Real-time monitored by reflection high-energy electron diffraction (RHEED) images show that
below 500 C
ZnO thin film was grown by three-dimension (3D) growth mode. While the two-dimension (2D) growth mode was obtained above growth temperature of 650 C. Atomic force microscopy (AFM) images present that the surface morphology of ZnO thin film with 2D growth is improved and X-ray rocking curves (XRC) indicate that the full width at half maximum (FWHM) of the ZnO (0 0 2) peak becomes narrow. From the photoluminescence (PL) spectra
ultraviolet (UV) emission peak exhibits obvious blue-shift for the samples grown at lower temperature
which is attributed to the effect of the quantum confinement arisen from small crystal grain sizes. The minimum carrier concentration of N=7.661016 cm-3 was obtained in the ZnO thin films with the 2D grown
which is closed to that of bulk ZnO. 2005 Elsevier B.V. All rights reserved.
Characterization of ZnO/Mg0.12Zn0.88O heterostructure grown by plasma-assisted molecular beam epitaxy (EI CONFERENCE)
会议论文
OAI收割
13th International Conference on Molecular Beam Epitaxy, August 22, 2004 - August 27, 2004, 13th International Conference on Molecular Beam Epitaxy, August 22, 2004 - August 27, 2004
Lu Y. M.
;
Wu C. X.
;
Wei Z. P.
;
Zhang Z. Z.
;
Zhao D. X.
;
Zhang J. Y.
;
Liu Y. C.
;
Shen D. Z.
;
Fan X. W.
收藏
  |  
浏览/下载:31/0
  |  
提交时间:2013/03/25
In this paper
Mg0.12Zn0.88O/ZnO heterostructures were fabricated on c-plane sapphire (Al2O3) substrates by plasma-assisted molecular beam epitaxy (P-MBE). The quality of the Mg 0.12Zn0.88O alloy thin film was characterized by X-ray diffraction (XRD) and reflection high-energy electron diffraction (RHEED). Optical properties of the Mg0.12Zn0.88O/ZnO heterostructure were studied by absorption and photoluminescence (PL) spectra. At room temperature (RT)
Mg0.12Zn0.88O/ZnO heterostructures show two absorption edges originating from ZnO and Mg 0.12Zn0.88O layers
respectively. In PL spectra
two ultraviolet emission bands related to the ZnO layer and the Mg 0.12Zn0.88O layer were observed. The emission band from Mg0.12Zn0.88O layer dominates at moderately lower temperature
and the luminescence of ZnO becomes gradually important with increasing temperature. This is suggested to exist as a potential barrier in the interface and to restrict the relaxation of the carriers from the Mg 0.12Zn0.88O layer to ZnO layer. As the thickness of ZnO layer decreases
the emission from the Mg0.12Zn0.88O layer becomes weaker and weaker. When the ZnO thickness is up to 2 nm
only the luminescence of the ZnO layer is observed at RT. The quenching of the emission corresponding to the MgZnO layer indicates the existence of a strong injection process in the samples with thinner ZnO layer. 2005 Elsevier B.V. All rights reserved.