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浏览/检索结果: 共16条,第1-10条 帮助

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Facile fabrication of 3D flower-like V2Al1-xCTz as an anode for lithium-ion batteries 期刊论文  OAI收割
JOURNAL OF ALLOYS AND COMPOUNDS, 2022, 卷号: 908, 页码: 10
作者:  
Liu, Rui Jia;  Yang, Ling Xu;  Lin, Guang Qiang;  Zhang, Tian Yu;  Bu, Huan Peng
  |  收藏  |  浏览/下载:44/0  |  提交时间:2022/07/14
Optical spectroscopy of the be/x-ray binary v850 centauri/gx 304-1 during faint x-ray periodical activity 期刊论文  iSwitch采集
Astronomy & astrophysics, 2017, 卷号: 603, 页码: 7
作者:  
Malacaria, C.;  Kollatschny, W.;  Whelan, E.;  Santangelo, A.;  Klochkov, D.
收藏  |  浏览/下载:26/0  |  提交时间:2019/04/23
Optical spectroscopy of the Be/X-ray binary V850 Centauri/GX 304-1 during faint X-ray periodical activity 期刊论文  OAI收割
ASTRONOMY & ASTROPHYSICS, 2017, 卷号: 603, 页码: A24
作者:  
Klochkov, D;  Whelan, E;  Kollatschny, W;  Malacaria, C;  Ducci, L
  |  收藏  |  浏览/下载:26/0  |  提交时间:2019/08/27
一种缓释型青霉素阴离子插层水滑石材料及其制备和应用 专利  OAI收割
专利类型: 发明, 专利号: CN201110290535.3, 申请日期: 2012-06-20, 公开日期: 2012-06-20
作者:  
王毅
收藏  |  浏览/下载:46/0  |  提交时间:2014/08/04
Effect of adding Cr on magnetic properties and metallic behavior in MnTe film (EI CONFERENCE) 会议论文  OAI收割
作者:  
Li J.;  Li J.;  Li J.
收藏  |  浏览/下载:44/0  |  提交时间:2013/03/25
一种缓释型苯甲酸根阴离子插层水滑石碳钢防腐蚀材料及其制备和应用 专利  OAI收割
专利类型: 发明, 专利号: CN201110041730.2, 申请日期: 2011-08-03, 公开日期: 2011-08-03
作者:  
王毅
收藏  |  浏览/下载:39/0  |  提交时间:2014/08/04
磷嗪对Ti6Al4V/钢摩擦副摩擦磨损性能的影响 期刊论文  OAI收割
润滑与密封, 2010, 卷号: 35, 期号: 7, 页码: 86-90
作者:  
王芳;  毕秦岭
收藏  |  浏览/下载:25/0  |  提交时间:2012/09/28
Color videos' multichannel combination for bandwidth reduction and fast frequency domain processing (EI CONFERENCE) 会议论文  OAI收割
2nd International Workshop on Education Technology and Computer Science, ETCS 2010, March 6, 2010 - March 7, 2010, Wuhan, Hubei, China
作者:  
Li S.
收藏  |  浏览/下载:18/0  |  提交时间:2013/03/25
多通道柔性神经微电极加工工艺 期刊论文  OAI收割
光学精密工程, 2009, 期号: 10
邢玉梅; 惠春; 徐爱兰; 李刚; 赵建龙; 任秋实
收藏  |  浏览/下载:12/0  |  提交时间:2012/01/06
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE) 会议论文  OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.; Gao W.; Liao Y.; Jing H.; Fu G.
收藏  |  浏览/下载:24/0  |  提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress  it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping  a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper  controlling different flow ratio of source gas SiH4 and NH3  and a great deal of tests (ellipsometer  infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators  three different capacitance samples in MIS structure were done  degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation  this result indicated that the defect density of this type SiN x was smaller  and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT  SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.