机构

• 高能物理研究所 [4]
• 长春光学精密机械与物... [1]

采集方式

• OAI收割 [5]

内容类型

• 期刊论文 [4]
• 会议论文 [1]

发表日期

• 2022 [1]
• 2018 [1]
• 2009 [1]
• 2005 [1]
• 2003 [1]

学科主题

• Physics [2]

筛选

浏览/检索结果: 共5条，第1-5条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 The Wide Field Monitor onboard the Chinese-European X-ray mission eXTP 期刊论文  OAI收割 SPACE TELESCOPES AND INSTRUMENTATION 2022: ULTRAVIOLET TO GAMMA RAY, 2022, 卷号: 12181, 页码: 121811Y 作者:  eXTP   |  收藏  |  浏览/下载：8/0  |  提交时间：2023/11/09 X-ray timing  X-ray spectroscopy  compact objects: black holes  neutron stars and white dwarfs  gamma-ray bursts  X-ray bursts  gravitational wave events  silicon drift detectors  coded mask imaging   The Wide Field Monitor onboard the eXTP mission 期刊论文  OAI收割 PROCEEDINGS OF SPIE, 2018, 卷号: 10699, 页码: UNSP 1069948 作者:  eXTP Consortium   |  收藏  |  浏览/下载：71/0  |  提交时间：2019/09/24 eXTP  LOFT  X-ray timing  X-ray spectroscopy  Silicon Drift Detectors  coded mask imaging  compact objects  gamma-ray bursts   Fabrication and testing of hard X-ray hourglass lenses (EI CONFERENCE) 会议论文  OAI收割 Micro and Nano Technology - 1st International Conference Society of Micro/Nano Technology, CSMNT, November 19, 2008 - November 22, 2008, Beijing, China 作者:  Zhu Y.;  Wang W.;  Wang W. 收藏  |  浏览/下载：26/0  |  提交时间：2013/03/25 Based on the refraction theory of the lens  the SU-8 photoresist hard X-ray hourglass lenses with three different structure parameters are fabricated. The mask-back exposure technique is introduced to fabricate the lenses. The focusing performance of this device is tested at Beijing Synchrotron Radiation Facility (BSRF). At the distance of 1.65m from the lenses  an obviously focusing performance in one dimension is observed. The relative intensity of the lenses with the largest gain is about 217.7  the gain of the lens is about 1.15  and the dimension of the focus is about 33m. The focusing performance of this device can be improved through the developing of the mask-back exposure technique. 2009 Trans Tech Publications  Switzerland.   Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application 期刊论文  OAI收割 HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION, 2005, 卷号: 29, 页码: #REF! 作者:  Xie, CQ;  Niu, JB;  Wang, DQ;  Dong, LJ;  Chen, DP 收藏  |  浏览/下载：26/0  |  提交时间：2016/04/12 proximity X-ray lithography  X-ray mask  TaSi film  inductively coupled plasma  synchrotron radiation   X-ray lithography technology for the fabrication of deep-submicron T-shaped gate 期刊论文  OAI收割 HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION, 2003, 卷号: 27, 页码: #REF! 作者:  Xie, CQ;  Chen, DP;  Li, B;  Wang, DQ;  Ye, TC 收藏  |  浏览/下载：23/0  |  提交时间：2016/04/12 X-ray lithography  X-ray mask  deep-submicron T-shaped gate  blur