中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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浏览/检索结果: 共15条,第1-10条 帮助

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Accelerated Fe3+/Fe2+ cycle using atomic H* on Pd/Al2O3: A novel mechanism for an electrochemical system with particle electrode for iron sludge reduction in the Fe2+/peroxydisulfate oxidation process 期刊论文  OAI收割
CHEMICAL ENGINEERING JOURNAL, 2020, 卷号: 382, 页码: 1-8
作者:  
Zeng, Huabin;  Zhao, Xu;  Zhao, Feiping;  Park, Yuri;  Sillanpaa, Mika
  |  收藏  |  浏览/下载:61/0  |  提交时间:2021/09/14
Mass measurements of neutron-deficient Y, Zr, and Nb isotopes and their impact on rp and nu p nucleosynthesis processes 期刊论文  OAI收割
PHYSICS LETTERS B, 2018, 卷号: 781, 页码: 358-363
作者:  
Yamaguchi, T.;  Ozawa, A.;  Frohlich, C.;  Rauscher, T.;  Thielemann, F. -K.
  |  收藏  |  浏览/下载:80/0  |  提交时间:2018/07/16
Mass measurements of neutron-deficient Y, Zr, and Nb isotopes and their impact on rp and nu p nucleosynthesis processes 期刊论文  OAI收割
PHYSICS LETTERS B, 2018, 卷号: 781, 页码: 358-363
作者:  
Xing, Y. M.;  Li, K. A.;  Zhang, Y. H.;  Zhou, X. H.;  Wang, M.
  |  收藏  |  浏览/下载:52/0  |  提交时间:2020/03/10
Confined-solution process for high-quality CH3NH3PbBr3 single crystals with controllable morphologies 期刊论文  OAI收割
NANO RESEARCH, 2018, 卷号: 11, 期号: 6, 页码: 3306-3312
作者:  
Li, Yitan;  Han, Lu;  Liu, Qiao;  Wang, Wei;  Chen, Yuguang
  |  收藏  |  浏览/下载:42/0  |  提交时间:2019/04/09
Using electron beams to investigate catalytic materials 期刊论文  OAI收割
Comptes Rendus Physique, 2014, 卷号: 15, 期号: 2-3, 页码: 258-268
B. S. Zhang; D. S. Su
收藏  |  浏览/下载:25/0  |  提交时间:2014/07/03
Photocatalytic Bactericidal Mechanism of Nanoscale TiO(2) Films on Escherichia coli 期刊论文  OAI收割
Journal of Nanoscience and Nanotechnology, 2011, 卷号: 11, 期号: 9, 页码: 7621-7626
D. M. Pan; Z. B. Zhan; D. G. Chen; Z. C. Wu; A. Y. Pang; Y. H. Wang; Z. Lin
收藏  |  浏览/下载:36/0  |  提交时间:2012/06/06
Temperature and Relative Humidity Dependency of Film Formation of Polymeric Latex Dispersions 期刊论文  OAI收割
langmuir, 2011, 卷号: 27, 期号: 21, 页码: 12807-12814
Chen XL; Fischer S; Men YF
收藏  |  浏览/下载:22/0  |  提交时间:2012/06/08
SMD simulations of shear loading induced dissociation of P-selectin/PSGL-1 complex 会议论文  OAI收割
3rd International Conference on Bioinformatics and Biomedical Engineering, iCBBE 2009, Beijing, China, June 11, 2009 - June 13, 2009
作者:  
Ren P;  Lv SQ(吕守芹);  Kang YY(康英永);  Huo B(霍波);  Long M(龙勉)
收藏  |  浏览/下载:120/0  |  提交时间:2017/07/14
Automatic spin coater for concave spherical substrate (EI CONFERENCE) 会议论文  OAI收割
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
Fengchao L.; Jingsong G.; Xiaoguo F.; Jingli Z.; Zhijun X.; Jun H.; Fenglin X.; Huiqing W.; Xiaohan L.
收藏  |  浏览/下载:23/0  |  提交时间:2013/03/25
Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer  for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS  an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively  valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed  acceleration and viscosity of the photoresist. After development  the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate  the film thickness error was within 1%  and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater  which contributes to quality improvement of laser direct writing lines on CSS.  
Surface roughness scaling of microcrystalline silicon films by hot-wire chemical vapor deposition 期刊论文  iSwitch采集
Journal of crystal growth, 2005, 卷号: 285, 期号: 4, 页码: 491-498
作者:  
Gu, JH;  Zhou, YQ;  Zhu, MF;  Liu, FZ;  Liu, JL
收藏  |  浏览/下载:42/0  |  提交时间:2019/05/10