中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
首页
机构
成果
学者
登录
注册
登陆
×
验证码:
换一张
忘记密码?
记住我
×
校外用户登录
CAS IR Grid
机构
武汉植物园 [2]
长春光学精密机械与物... [1]
水生生物研究所 [1]
采集方式
OAI收割 [4]
内容类型
期刊论文 [3]
会议论文 [1]
发表日期
2020 [1]
2017 [1]
2016 [1]
2005 [1]
学科主题
筛选
浏览/检索结果:
共4条,第1-4条
帮助
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
题名升序
题名降序
提交时间升序
提交时间降序
作者升序
作者降序
发表日期升序
发表日期降序
Phylogenetic Analysis and Substitution Rate Estimation of Colonial Volvocine Algae Based on Mitochondrial Genomes
期刊论文
OAI收割
GENES, 2020, 卷号: 11, 期号: 1, 页码: 12
作者:
Hu, Yuxin
;
Xing, Weiyue
;
Hu, Zhengyu
;
Liu, Guoxiang
  |  
收藏
  |  
浏览/下载:29/0
  |  
提交时间:2020/04/23
colonial volvocine algae
dN
dS ratio
mitochondrial genome
phylogenetic analysis
substitution rates
Candidate genes for adaptation to an aquatic habitat recovered from Ranunculus bungei and Ranunculus sceleratus
期刊论文
OAI收割
BIOCHEMICAL SYSTEMATICS AND ECOLOGY, 2017, 卷号: 71, 页码: 16-25
作者:
Zhao, Shu-Ying
;
Chen, Ling-Yun
;
Wang, Qing-Feng
;
Moody, Michael L.
  |  
收藏
  |  
浏览/下载:30/0
  |  
提交时间:2017/12/31
Adaptive evolution
Aquatic plant
dN/dS ratio
Positive selection
Ranunculus
Genetic Adaptation of Giant Lobelias (Lobelia aberdarica and Lobelia telekil) to Different Altitudes in East African Mountains
期刊论文
OAI收割
FRONTIERS IN PLANT SCIENCE, 2016, 卷号: 7, 页码: 9
作者:
Zhao, Shu-Ying
;
Chen, Ling-Yun
;
Muchuku, John K.
;
Hu, Guang-Wan
;
Wang, Qing-Feng
  |  
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2017/04/13
dN/dS ratio (omega)
giant lobelias
natural selection
RNA-Seq
high altitude
The application of auto-controlled liquid crystal light valve arrays to photolithography shutter (EI CONFERENCE)
会议论文
OAI收割
ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005, Changchun, China
作者:
Chen Y.
收藏
  |  
浏览/下载:15/0
  |  
提交时间:2013/03/25
Photolithography shutter is usually used to control exposure in order to obtain patterns of code disc and metrology grating which are the core components of optical shaft encoder. But perforated film as photolithography shutter has many disadvantages such as taking too long time to perforate
easily making wrong code
lower reusable ratio. Mathematical models for resist property
luminous efficiency and exposure have been established by deducing their relations for avoiding the disadvantages
which provides the theory of using liquid crystal light valve (LCLV) replacing proforated film. Based on operating principles of LCLV and control theories of photolithography shutter
the principle diagram of control circuit of LCLV arrays has been designed according to theirs control principles. In the control system
LCLV arrays as photolithography shutter are realized by adopting DS75451 to drive them and using AT89C51 chip to control them. By photolithographic experiment
the patterns of code disc are good
the edges of lines are vertical
it indicates LCLV arrays as photolithography shutter may control exposure and light passing accords with the intending requires. It proves using LCLV arrays replacing perforated film as photolithography shutter is feasible completely.