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浏览/检索结果: 共9条，第1-9条 帮助

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Quality evaluation of solar magnetic field images at EUV wavelengths in digital image correlation method 期刊论文  OAI收割
Journal of Computational Methods in Sciences and Engineering, 2019, 卷号: 19, 期号: 4, 页码: 1109-1123
作者:  Y.Liu;  K.-F.Song;  J.-L.Ma;  X.-D.Wang;  Z.-W.Han
  |  收藏  |  浏览/下载：35/0  |  提交时间：2020/08/24
Design and fabrication of EUV broadband multilayer mirrors with discrete thicknesses 期刊论文  OAI收割
Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2018, 卷号: 26, 期号: 10, 页码: 2395-2406
作者:  Kuang, Shang-Qi;  Li, Shuo;  Yang, Hai-Gui;  Huo, Tong-Lin;  Zhou, Hong-Jun
  |  收藏  |  浏览/下载：15/0  |  提交时间：2019/09/17
Detection system of multilayer coating microstructure defects based on differential interference contrast confocal microscopy 期刊论文  OAI收割
Chinese Optics, 2018, 卷号: 11, 期号: 2, 页码: 255-264
作者:  Dai, Cen;  Gong, Yan;  Zhang, Hao;  Li, Dian-Meng;  Xue, Jin-Lai
  |  收藏  |  浏览/下载：14/0  |  提交时间：2019/09/17
Mechanismand model of atomic hydrogen cleaning for different types of carbon contamination on extreme ultraviolet multilayers 期刊论文  iSwitch采集
Thin solid films, 2016, 卷号: 612, 页码: 96-100
作者:  Song, Yuan;  Lu, Qipeng;  Gong, Xuepeng
收藏  |  浏览/下载：37/0  |  提交时间：2019/05/09
Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography 期刊论文  OAI收割
j. micro-nanolithogr. mems moems, 2014, 卷号: 13, 期号: 3, 页码: 33007
作者:  Liu, Xiaolei;  Wang, Xiangzhao;  Li, Sikun;  Yan, Guanyong
收藏  |  浏览/下载：26/0  |  提交时间：2016/11/28
Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography 期刊论文  OAI收割
j. micro-nanolithogr. mems moems, 2014, 卷号: 13, 期号: 3, 页码: 33007
作者:  Liu, Xiaolei;  Wang, Xiangzhao;  Li, Sikun;  Yan, Guanyong;  Erdmann, Andreas
收藏  |  浏览/下载：20/0  |  提交时间：2016/11/28
Analysis of measuring errors for the visible light phase-shifting point diffraction interferometer (EI CONFERENCE) 会议论文  OAI收割
2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010, December 3, 2010 - December 6, 2010, Guangzhou, China
作者:  Zhang Y.
收藏  |  浏览/下载：13/0  |  提交时间：2013/03/25
In order to improve the measuring accuracy of the visible light phase-shifting point diffraction interferometer (PS/PDI) for the extreme ultraviolet lithography (EUVL) aspheric mirrors  the main measuring errors will be discussed in this paper. At first  the elementary configuration and measuring principle of the visible light phase-shifting point diffraction interferometer are introduced briefly  then the different errors which are possible to affect the measuring result are summed up  the errors include PZT phase-shifting error  detector nonlinearity error  detector quantization error  wavelength instability error and intensity instability error of the laser source  vibration error  air refractivity instability error and so on. Through detailed analysis and simulation  the magnitude of these errors can be obtained. By analysing the reasons which cause these errors and the relationship between these errors and interferometer configuration parameters  some methods are put forward to avoid or restrain these errors accordingly.  
Transient thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography 期刊论文  iSwitch采集
Japanese journal of applied physics part 1-regular papers brief communications & review papers, 2007, 卷号: 46, 期号: 10a, 页码: 6568-6572
作者:  Liu, Ke;  Li, Yanqiu;  Zhang, Fuchang;  Fan, Mingzhe
收藏  |  浏览/下载：31/0  |  提交时间：2019/05/10
Time and space-resolved measurement of a gas-puff laser-plasma x-ray source 期刊论文  OAI收割
phys. plasmas, 2003, 卷号: 10, 期号: 1, 页码: 227, 233
Suzuki M; Daido H; Choi IW; Yu W; Nagai K; Norimatsu T; Mima K; Fiedorowicz H
收藏  |  浏览/下载：1516/315  |  提交时间：2009/09/18