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	A general method of designing phase-shifting algorithms for grating lateral shearing interferometry 期刊论文 OAI收割 Frontiers of Information Technology & Electronic Engineering, 2018, 卷号: 19, 期号: 6, 页码: 809-814 作者: Fang, C.; Xiang, Y.; Qi, K. Q. \| 收藏 \| 浏览/下载：26/0 \| 提交时间：2019/09/17 Interferometry Phase measurement Phase-shifting algorithms point-diffraction interferometer wave-front reconstruction hartmann-shack sensor spatial-resolution metrology optics euva Computer Science Engineering
	Analysis of measuring errors for the visible light phase-shifting point diffraction interferometer (EI CONFERENCE) 会议论文 OAI收割 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010, December 3, 2010 - December 6, 2010, Guangzhou, China 作者: Zhang Y. 收藏 \| 浏览/下载：32/0 \| 提交时间：2013/03/25 In order to improve the measuring accuracy of the visible light phase-shifting point diffraction interferometer (PS/PDI) for the extreme ultraviolet lithography (EUVL) aspheric mirrors the main measuring errors will be discussed in this paper. At first the elementary configuration and measuring principle of the visible light phase-shifting point diffraction interferometer are introduced briefly then the different errors which are possible to affect the measuring result are summed up the errors include PZT phase-shifting error detector nonlinearity error detector quantization error wavelength instability error and intensity instability error of the laser source vibration error air refractivity instability error and so on. Through detailed analysis and simulation the magnitude of these errors can be obtained. By analysing the reasons which cause these errors and the relationship between these errors and interferometer configuration parameters some methods are put forward to avoid or restrain these errors accordingly.
	Design and tolerance analysis of compensator for high order aspheric surface testing (EI CONFERENCE) 会议论文 OAI收割 2009 International Conference on Optical Instruments and Technology - Optoelectronic Measurement Technology and Systems, October 19, 2009 - October 22, 2009, Shanghai, China 作者: Chen X.; Liu W.; Chen X.; Chen X. 收藏 \| 浏览/下载：44/0 \| 提交时间：2013/03/25 High accuracy is required in surface testing of 90nm nodal point lithography projecting lens. By comparing various aspheric surface testing methods the structure layout of the compensator is a meniscus positive lens combined with a Plano-convex positive lens. The design results indicate that: primary and high order aberrations are balanced well we adopt Offner null compensator to test the aspheric surface in the point diffraction interferometer at last. In this paper MTF exceeds diffraction limit an Offner compensator is presented on the base of the third order aberration theory to test concave aspheric surface root-mean-square (RMS) of wave front error /167. The F-number of the system can achieve F/1.64. By the analysis of the process of aspheric surface testing with the designed system the optical construction parameters of which is determined by introducing equal-quantities spherical aberration to compensate all orders of aspheric coefficients. The field of view of the system is 0.02 a loosen distribution of the tolerance was presented based on the accuracy of measuring apparatus. 2009 SPIE.