机构

• 光电技术研究所 [2]
• 半导体研究所 [2]
• 合肥物质科学研究院 [2]
• 长春光学精密机械与物... [1]
• 化学研究所 [1]
• 数学与系统科学研究院 [1]
• 更多

采集方式

• OAI收割 [8]
• iSwitch采集 [1]

内容类型

• 期刊论文 [6]
• 会议论文 [3]

发表日期

• 2020 [2]
• 2018 [2]
• 2016 [1]
• 2011 [1]
• 2008 [1]
• 2006 [2]
• 更多

学科主题

• 光电子学 [1]

筛选

浏览/检索结果: 共9条，第1-9条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Ordered gold-coated glass nano-sting array with large density tips as highly SERS-active chips for detection of trace organophosphorous toxicant 期刊论文  OAI收割 NANOTECHNOLOGY, 2020, 卷号: 31 作者:  Zhao, Qian;  Liu, Guangqiang;  Zhang, Hongwen;  Cai, Weiping   |  收藏  |  浏览/下载：39/0  |  提交时间：2020/11/26 gold-coated glass nano-sting arrays  high density nano-tips  colloidal template  reactive ion etching  high performance sers chips  ultrasensitive detection of toxic organophosphorus molecules   Simulation of Discharge Characteristics for the Plasma Etching of Large Area SiO2 Substrates 期刊论文  OAI收割 JOURNAL OF RUSSIAN LASER RESEARCH, 2020, 卷号: 41, 期号: 3, 页码: 258-267 作者:  Zhang, Jingwen;  Fan, Bin;  Li, Zhiwei;  Gao, Guohan;  Li, Bincheng   |  收藏  |  浏览/下载：31/0  |  提交时间：2021/05/11 Reactive Ion Etching  Capacitive Coupled Discharge  Fluid Simulation  Discharge Parameter  Large Area Sio2 Substrates  Plasma Radial Uniformity   Development of a Novel CMUT-Based Concentric Dual-Element Ultrasonic Transducer: Design, Fabrication, and Characterization 期刊论文  OAI收割 JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2018, 卷号: 27, 期号: 3, 页码: 538-546 作者:  Zheng, Zhou;  Na, Shuai;  Chen, Albert I. -Hsiang;  Li, Zhenhao;  Wong, Lawrence L. P.   |  收藏  |  浏览/下载：44/0  |  提交时间：2018/07/30 Annular element  capacitive micromachined ultrasonic transducer (CMUT)  concentric  deep reactive-ion etching  dual-element  hybrid transducer   Gas Flow Simulation Research on Reaction Chamber of Reactive ion etching 会议论文  OAI收割 Chengdu, PEOPLES R CHINAChengdu, PEOPLES R CHINA, JUN 26-29, 2018JUN 26-29, 2018 作者:  Zhang Jingwen;  Fan Bin;  Li Zhiwei;  Liu Xin;  Li Bincheng   |  收藏  |  浏览/下载：29/0  |  提交时间：2019/08/23 reactive ion etching  Fluent(Ansys)  numerical simulation  pressure distribution   Effective SERS-active substrates composed of hierarchical micro/nanostructured arrays based on reactive ion etching and colloidal masks 期刊论文  OAI收割 Nanotechnology, 2016, 卷号: 27 作者:  Zhang,Honghua;  Liu,Dilong;  Hang,Lifeng;  Li,Xinyang;  Liu,Guangqiang   |  收藏  |  浏览/下载：14/0  |  提交时间：2020/10/21 periodic SiO2 array  nanosphere lithography  reactive ion etching  SERS  4-ATP   Controllable growth of highly ordered zno nanorod arrays via inverted self-assembled monolayer template 期刊论文  iSwitch采集 Acs applied materials & interfaces, 2011, 卷号: 3, 期号: 11, 页码: 4388-4395 作者:  Dong, J. J.;  Zhang, X. W.;  Yin, Z. G.;  Zhang, S. G.;  Wang, J. X. 收藏  |  浏览/下载：122/0  |  提交时间：2019/05/12 Zinc oxide nanorods  Hydrothermal synthesis  Inverted self-assembled monolayer  Reactive ion etching  Epitaxial growth   Superluminescent diode monolithically integrated with novel Y-branch by bundle integrated waveguide for fiber optic gyroscope - art. no. 68380D 会议论文  OAI收割 2nd conference on optoelectronic devices and integration, beijing, peoples r china, nov 12-15, 2007 Wang, L; Zhao, LJ; Chen, WX; Pan, JQ; Zhou, F; Zhu, HL; Wang, W 收藏  |  浏览/下载：52/0  |  提交时间：2010/03/09 photonic integrated circuit  Y-branch  superluminescent diode  bundle integrated guide  far field pattern  reactive ion etching   Cicada wings: A stamp from nature for nanoimprint lithography 期刊论文  OAI收割 SMALL, 2006, 卷号: 2, 期号: 12, 页码: 1440-1443 作者:  Zhang, Guoming;  Zhang, Jin;  Xie, Guoyong;  Liu, Zhongfan;  Shao, Huibo   |  收藏  |  浏览/下载：24/0  |  提交时间：2019/04/09 Biophysics  Cicada Wings  Imprint Lithography  Nanostructures  Reactive Ion Etching   Fabrication of 3232 polymer arrayed waveguide gratings using remelting technique (EI CONFERENCE) 会议论文  OAI收割 ICO20: Optical Communication, August 21, 2005 - August 26, 2005, Changshun, China 作者:  Zhang D.;  Zhang X.;  Zhang X.;  Zhang X.;  Wang F. 收藏  |  浏览/下载：19/0  |  提交时间：2013/03/25 A 32 32 arrayed waveguide grating (AWG) multiplexer operating around the 1550 nm wavelength has been designed and fabricated using fluorinated poly (ether ether ketone). The schematic layout is about 3.21.7 cm 2. For our AWG  the total loss of designed AWG multiplexer is calculated to be 4.5 dB. We fabricated the AWG multiplexer by spin coating  photolithographic patterning and reactive ion etching (RIE). The core size is 55 m2. The roughness of polymer surface was reduced by 20 nm using a remelting technique. The measured wavelength channel spacing of the fabricated AWG multiplexer is 0.796 nm and center wavelength is 1548 nm. The inserting loss of the AWG is 9.5 dB and crosstalk less than -20 dB.