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	1.3-mu m in(ga)as quantum-dot vcsels fabricated by dielectric-free approach with surface-relief process 期刊论文 iSwitch采集 Ieee photonics technology letters, 2011, 卷号: 23, 期号: 2, 页码: 91-93 作者: Xu, D. W.; Yoon, S. F.; Ding, Y.; Tong, C. Z.; Fan, W. J. 收藏 \| 浏览/下载：27/0 \| 提交时间：2019/05/12 Dielectric-free approach Quantum dot (qd) Surface-relief technique Vertical-cavity surface-emitting lasers (vcsels)
	1.3-mu m In(Ga)As Quantum-Dot VCSELs Fabricated by Dielectric-Free Approach With Surface-Relief Process 期刊论文 OAI收割 ieee photonics technology letters, 2011, 卷号: 23, 期号: 2, 页码: 91-93 Xu DW; Yoon SF; Ding Y; Tong CZ; Fan WJ; Zhao LJ 收藏 \| 浏览/下载：120/2 \| 提交时间：2011/07/05 Dielectric-free approach quantum dot (QD) surface-relief technique vertical-cavity surface-emitting lasers (VCSELs) EMITTING LASERS
	Application of photoresist melting method to the fabrication of holographic grating (EI CONFERENCE) 会议论文 OAI收割 ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005, Changchun, China 作者: Li W.; Tang Y.; Yu H.; Gao J.; Li W. 收藏 \| 浏览/下载：63/0 \| 提交时间：2013/03/25 A new technique of reducing surface roughness of photoresist grating is presented. In this paper photoresist melting method which is low-cost short-period and easy realization is presented. In addition the influence of photoresist melting on the groove profile of the photoresist grating is investigated. Experimental results show that the surface roughness reduces due to surface tension when developed photoresist is heated to be melting state by this method. In experiment when the melted photoresist grating is etched by ion beam the surface relief grating possessing preferable groove profile is obtained on K9 glass substrate then the surface is evaporated by aluminum using vacuum evaporation holographic grating with preferable groove profile is successively fabricated.