机构

• 力学研究所 [1]
• 地质与地球物理研究所 [1]
• 长春光学精密机械与物... [1]

采集方式

• OAI收割 [3]

内容类型

• 期刊论文 [2]
• 会议论文 [1]

发表日期

• 2021 [1]
• 2020 [1]
• 2005 [1]

学科主题

筛选

浏览/检索结果: 共3条，第1-3条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Numerical analysis of deep hole multi-stage cut blasting of vertical shaft using a continuum-based discrete element method 期刊论文  OAI收割 ARABIAN JOURNAL OF GEOSCIENCES, 2021, 卷号: 14, 期号: 12, 页码: 11 作者:  Ding, Chenxi;  Yang, Renshu;  Zheng, Changda;  Yang, Liyun;  He, Songlin   |  收藏  |  浏览/下载：38/0  |  提交时间：2021/08/03 Vertical shaft  Cut blasting  Continuum-based discrete element method  Fractal damage  Fracture degree   Deformation Failure Mechanism of Deep Vertical Shaft in Jinchuan Mining Area 期刊论文  OAI收割 SUSTAINABILITY, 2020, 卷号: 12, 期号: 6, 页码: 23 作者:  Sun, Qihao;  Ma, Fengshan;  Guo, Jie;  Li, Guang;  Feng, Xuelei   |  收藏  |  浏览/下载：153/0  |  提交时间：2020/05/18 metal mine  vertical shaft  failure mechanism  fault activation  UDEC   The application of auto-controlled liquid crystal light valve arrays to photolithography shutter (EI CONFERENCE) 会议论文  OAI收割 ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005, Changchun, China 作者:  Chen Y. 收藏  |  浏览/下载：14/0  |  提交时间：2013/03/25 Photolithography shutter is usually used to control exposure in order to obtain patterns of code disc and metrology grating which are the core components of optical shaft encoder. But perforated film as photolithography shutter has many disadvantages such as taking too long time to perforate  easily making wrong code  lower reusable ratio. Mathematical models for resist property  luminous efficiency and exposure have been established by deducing their relations for avoiding the disadvantages  which provides the theory of using liquid crystal light valve (LCLV) replacing proforated film. Based on operating principles of LCLV and control theories of photolithography shutter  the principle diagram of control circuit of LCLV arrays has been designed according to theirs control principles. In the control system  LCLV arrays as photolithography shutter are realized by adopting DS75451 to drive them and using AT89C51 chip to control them. By photolithographic experiment  the patterns of code disc are good  the edges of lines are vertical  it indicates LCLV arrays as photolithography shutter may control exposure and light passing accords with the intending requires. It proves using LCLV arrays replacing perforated film as photolithography shutter is feasible completely.