机构

• 长春光学精密机械与物... [1]

采集方式

• OAI收割 [1]

内容类型

• 会议论文 [1]

发表日期

• 2007 [1]

学科主题

筛选

浏览/检索结果: 共1条，第1-1条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择提交时间升序提交时间降序发表日期升序发表日期降序题名升序题名降序作者升序作者降序 Development of an experimental EUVL system (EI CONFERENCE) 会议论文  OAI收割 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China 作者:  Wang L.-P.;  Zhang L.-C.;  Jin C.-S. 收藏  |  浏览/下载：13/0  |  提交时间：2013/03/25 An experimental EUVL system has been developed to investigate EUV imaging system design  component fabrication  assembly technique and experimental process. The system includes a laser produced plasma (LPP) source  an ellipsoidal condenser  a transmission mask  a reduced projection optics  and vacuum system. We designed a 10:1 reduction projection optics using Schwarzschild system with spherical mirrors to achieve 0.1m resolution. The Schwarzschild optics coated with Mo/Si multilayers was assembled with wavefront error (WFE) of 0.014 waves RMS at 632.8nm wavelength under computer-aided alignment method. Using this system a fine pattern of less than 0.25m covering a 0.1mm diameter image field of view was clearly replicated on resist-coated wafer.