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Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文  OAI收割
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.
收藏  |  浏览/下载：20/0  |  提交时间：2013/03/25
In ultraviolet spectroscopy  groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore  there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order  it is important to control the groove shape precisely  so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm  especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method  the required blaze angle is small  we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles  and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model  the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides  since the etched groove shape depends on the aspect ratio of the photoresist mask ridge  if we wish to fabricate larger gratings with this method  we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).  
Regional effects of secondary ecological migration in pasturing area: A case of Fuhai county in Xinjiang 会议论文  OAI收割
2009 International Conference on Environmental Science and Information Application Technology, ESIAT, Wuhan, China, 2009
Changlong; Sun1; 2; Jia; Liu1; Xiaolei; Zhang1; Hongru; Du1; Wenwen; Ma3
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