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CAS IR Grid
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长春光学精密机械与物... [1]
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OAI收割 [1]
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会议论文 [1]
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2007 [1]
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专题:长春光学精密机械与物理研究所
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Development of an experimental EUVL system (EI CONFERENCE)
会议论文
OAI收割
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
作者:
Wang L.-P.
;
Zhang L.-C.
;
Jin C.-S.
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浏览/下载:13/0
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提交时间:2013/03/25
An experimental EUVL system has been developed to investigate EUV imaging system design
component fabrication
assembly technique and experimental process. The system includes a laser produced plasma (LPP) source
an ellipsoidal condenser
a transmission mask
a reduced projection optics
and vacuum system. We designed a 10:1 reduction projection optics using Schwarzschild system with spherical mirrors to achieve 0.1m resolution. The Schwarzschild optics coated with Mo/Si multilayers was assembled with wavefront error (WFE) of 0.014 waves RMS at 632.8nm wavelength under computer-aided alignment method. Using this system a fine pattern of less than 0.25m covering a 0.1mm diameter image field of view was clearly replicated on resist-coated wafer.