中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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Influence of plasma gas and postcleaning on the electrical characteristics of plasma-exposed Al/n-Si Schottky diodes 期刊论文  OAI收割
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 卷号: 15, 期号: 2, 页码: 232
Kuroda, T; Lin, ZD; Iwakuro, H; Sato, S
收藏  |  浏览/下载:31/0  |  提交时间:2013/09/17
DAMAGE  SILICON  AR+  
Interfacial reactions of Pd and Pd/Si on GaAs 期刊论文  OAI收割
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1997, 卷号: 164, 期号: 2, 页码: 757
Iwakuro, H; Tamaki, S; Shen, DH; Lin, ZD; Kuroda, T
收藏  |  浏览/下载:22/0  |  提交时间:2013/09/18
Electric resistance between Ti and abraded Si(100) 期刊论文  OAI收割
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1997, 卷号: 160, 期号: 1, 页码: 77
Iwakuro, H; Kuroda, T; Lin, ZD
收藏  |  浏览/下载:11/0  |  提交时间:2013/09/17
Enhanced dry etching of silicon with deuterium plasma 期刊论文  OAI收割
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 卷号: 14, 期号: 2, 页码: 707
Iwakuro, H; Kuroda, T; Shen, DH; Lin, ZD
收藏  |  浏览/下载:16/0  |  提交时间:2013/09/17