机构

• 长春光学精密机械与物... [2]
• 中国科学院大学 [1]

采集方式

• OAI收割 [2]
• iSwitch采集 [1]

内容类型

• 会议论文 [2]
• 期刊论文 [1]

发表日期

• 2010 [1]
• 2007 [2]

学科主题

筛选

浏览/检索结果: 共3条，第1-3条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Analysis of measuring errors for the visible light phase-shifting point diffraction interferometer (EI CONFERENCE) 会议论文  OAI收割 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010, December 3, 2010 - December 6, 2010, Guangzhou, China 作者:  Zhang Y. 收藏  |  浏览/下载：15/0  |  提交时间：2013/03/25 In order to improve the measuring accuracy of the visible light phase-shifting point diffraction interferometer (PS/PDI) for the extreme ultraviolet lithography (EUVL) aspheric mirrors  the main measuring errors will be discussed in this paper. At first  the elementary configuration and measuring principle of the visible light phase-shifting point diffraction interferometer are introduced briefly  then the different errors which are possible to affect the measuring result are summed up  the errors include PZT phase-shifting error  detector nonlinearity error  detector quantization error  wavelength instability error and intensity instability error of the laser source  vibration error  air refractivity instability error and so on. Through detailed analysis and simulation  the magnitude of these errors can be obtained. By analysing the reasons which cause these errors and the relationship between these errors and interferometer configuration parameters  some methods are put forward to avoid or restrain these errors accordingly.   Pattern density dependence of thermal deformation of extreme ultraviolet mask and its impact on full field lithography performance 期刊论文  iSwitch采集 Japanese journal of applied physics part 1-regular papers brief communications & review papers, 2007, 卷号: 46, 期号: 8a, 页码: 5104-5111 作者:  Li, Yanqiu;  Zhou, Pengfei;  Fei, Zhang 收藏  |  浏览/下载：28/0  |  提交时间：2019/05/10 Euvl  Mask  Optics  Thermal deformation  Next generation of lithography   Development of an experimental EUVL system (EI CONFERENCE) 会议论文  OAI收割 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China 作者:  Wang L.-P.;  Zhang L.-C.;  Jin C.-S. 收藏  |  浏览/下载：19/0  |  提交时间：2013/03/25 An experimental EUVL system has been developed to investigate EUV imaging system design  component fabrication  assembly technique and experimental process. The system includes a laser produced plasma (LPP) source  an ellipsoidal condenser  a transmission mask  a reduced projection optics  and vacuum system. We designed a 10:1 reduction projection optics using Schwarzschild system with spherical mirrors to achieve 0.1m resolution. The Schwarzschild optics coated with Mo/Si multilayers was assembled with wavefront error (WFE) of 0.014 waves RMS at 632.8nm wavelength under computer-aided alignment method. Using this system a fine pattern of less than 0.25m covering a 0.1mm diameter image field of view was clearly replicated on resist-coated wafer.