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Influence of high-dose nitrogen implantation on the positive charge density of the buried oxide of silicon-on-insulator wafers 期刊论文  OAI收割
acta physica sinica, 2011, 卷号: 60, 期号: 5, 页码: article no.56104
作者:  
Yu F
收藏  |  浏览/下载:105/6  |  提交时间:2011/07/06
Effect of implantation of nitrogen into SIMOX buried oxide on its fixed positive charge density 期刊论文  OAI收割
ACTA PHYSICA SINICA, 2007, 卷号: 56, 期号: 9, 页码: 5446-5451
Zheng, ZS; Zhang, EX; Liu, ZL; Zhang, ZX; Li, N; Li, GH
收藏  |  浏览/下载:13/0  |  提交时间:2012/03/24
Improvement of total-dose irradiation hardness of silicon-on-insulator materials by modifying the buried oxide layer with ion implantation 期刊论文  OAI收割
CHINESE PHYSICS, 2006, 卷号: 15, 期号: 4, 页码: 792-797
Zhang, EX; Qian, C; Zhang, ZX; Lin, CL; Wang, X
收藏  |  浏览/下载:24/0  |  提交时间:2012/03/24