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Chinese Academy of Sciences Institutional Repositories Grid
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The ultra-high sensitivity of mass resonator achieved by the beam with variable thickness 期刊论文  OAI收割
RESULTS IN PHYSICS, 2023, 卷号: 49, 页码: 106483
作者:  
Wei CX(卫晨曦);  Zhang Y(张吟)
  |  收藏  |  浏览/下载:37/0  |  提交时间:2023/06/15
A review of dynamical resonances in A plus BC chemical reactions 期刊论文  OAI收割
REPORTS ON PROGRESS IN PHYSICS, 2017, 卷号: 80, 期号: 2
作者:  
Sun, Zhigang;  Zhang, Donghui;  Yang, Xueming;  Ren, Zefeng
收藏  |  浏览/下载:33/0  |  提交时间:2017/10/29
A review of dynamical resonances in A??+??BC chemical reactions 期刊论文  OAI收割
Reports on Progress in Physics, 2016, 卷号: 80, 期号: 2
作者:  
Sun,Zhigang;  Yang,Xueming;  Ren,Zefeng;  Zhang,Donghui
  |  收藏  |  浏览/下载:58/0  |  提交时间:2019/06/20
The influence of cell morphology on the compressive fatigue behavior of Ti-6Al-4V meshes fabricated by electron beam melting 期刊论文  OAI收割
JOURNAL OF THE MECHANICAL BEHAVIOR OF BIOMEDICAL MATERIALS, 2016, 卷号: 59, 页码: 251-264
Zhao, S.; Li, S. J.; Hou, W. T.; Hao, Y. L.; Yang, R.; Misra, R. D. K.
收藏  |  浏览/下载:64/0  |  提交时间:2016/08/22
Influence of cell shape on mechanical properties of Ti-6Al-4V meshes fabricated by electron beam melting method 期刊论文  OAI收割
Acta Biomaterialia, 2014, 卷号: 10, 期号: 10, 页码: 4537-4547
S. J. Li; Q. S. Xu; Z. Wang; W. T. Hou; Y. L. Hao; R. Yang; L. E. Murr
收藏  |  浏览/下载:42/0  |  提交时间:2015/01/14
Microstructure and mechanical behaviors of electron beam welded NiTi shape memory alloys 期刊论文  OAI收割
Materials & Design, 2014, 卷号: 57, 页码: 21-25
D. Yang; H. C. Jiang; M. J. Zhao; L. J. Rong
收藏  |  浏览/下载:27/0  |  提交时间:2014/04/18
Research on modeling of heat source for electron beam welding fusion-solidification zone 期刊论文  OAI收割
CHINESE JOURNAL OF AERONAUTICS, 2013, 卷号: 26, 期号: 1, 页码: 217-223
作者:  
Wang YJ;  Fu PF;  Guan YJ(关永军);  Lu ZJ;  Wei YT
收藏  |  浏览/下载:98/0  |  提交时间:2013/04/07
Tantalum coating on porous Ti6Al4V scaffold using chemical vapor deposition and preliminary biological evaluation 期刊论文  OAI收割
Materials Science & Engineering C-Materials for Biological Applications, 2013, 卷号: 33, 期号: 5, 页码: 2987-2994
X. Li; L. Wang; X. M. Yu; Y. F. Feng; C. T. Wang; K. Yang; D. Su
收藏  |  浏览/下载:31/0  |  提交时间:2013/12/24
Stiction of flexural MEMS structures 会议论文  OAI收割
3rd International Conference on Digital Manufacturing and Automation, ICDMA 2012, Guangxi, China, AUG 01-02, 2012
作者:  
Liu Y;  Zhang Y(张吟)
收藏  |  浏览/下载:35/0  |  提交时间:2013/02/26
Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文  OAI收割
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China
Tan X.
收藏  |  浏览/下载:29/0  |  提交时间:2013/03/25
In ultraviolet spectroscopy  groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore  there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order  it is important to control the groove shape precisely  so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm  especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method  the required blaze angle is small  we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles  and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model  the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides  since the etched groove shape depends on the aspect ratio of the photoresist mask ridge  if we wish to fabricate larger gratings with this method  we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).