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	直流磁控溅射制备TiAlCN薄膜及其性能研究期刊论文 OAI收割摩擦学学报, 2013, 卷号: 33, 期号: 1, 页码: 85-90 作者: 郑建云; 郝俊英; 刘小强; 龚秋雨; 刘维民收藏 \| 浏览/下载：103/0 \| 提交时间：2013/12/18 直流磁控溅射 TiAlCN薄膜微观结构硬度摩擦行为 direct current magnetron sputtering TiAlCN films microstructure hardness tribological behaviours
	Characteristics of ZnMgO-based metal-semiconductor-metal photodetectors (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Photoelectronic Imaging and Detection, September 9, 2007 - September 12, 2007, Beijing, China 作者: Zhang J.; Li B.; Li B.; Li B.; Zhao Y. 收藏 \| 浏览/下载：23/0 \| 提交时间：2013/03/25 In recent years ZnMgO semiconductor alloys with a direct bandgap tunable between 3.37 eV and 7.8 eV become one of the most suitable materials for the fabrication of ultraviolet detectors. In this paper we have fabricated metal-semiconductor-metal photodetectors on 1-m thick Zn 0.8Mg0.2O films. The interdigital metal electrodes are 500 m long and 5 m wide with an interelectrode spacing 2 m 5 m and 10 m respectively. Zn0.8Mg0.2O films were grown on quartz by ratio frequency magnetron sputtering at 500C. Dark current spectral responsivity and pulse response were carried out for the devices with different finger pitches. All the photodetectors showed the peak responsivity at 330 nm and the ultraviolet-visible rejection ratio (R330 nm/R400 nm) is more than four orders of magnitude at 3 V bias. For the device with 2 m finger pitch the detectivity was calculated as 4.21011 cm Hz 1/2/W at 330 nm. Furthermore the transient response measurement for all devices revealed similar rise time of 10 ns. The 90%-10% fall times are 130 ns 170 ns and 230 ns for the devices with different finger pitches of 2 m 5 m and 10 m respectively..
	氧化铋薄膜用于蓝光可录存储的研究期刊论文 OAI收割 Chin. Opt. Lett., 2008, 卷号: 6, 期号: 4, 页码: 294, 296 蒋志; 耿永友; 顾冬红收藏 \| 浏览/下载：1264/211 \| 提交时间：2009/09/22 氧化铋薄膜 BiOx thin films 光存储 Blue laser recording 光学材料 Reactive direct current (DC) magnetron sputtering Reflectivity Write once medium
	基底温度对直流磁控溅射ITO透明导电薄膜性能的影响期刊论文 OAI收割中国激光, 2008, 卷号: 35, 期号: 12, 页码: 2031, 2035 曾维强; 姚建可; 贺洪波; 邵建达收藏 \| 浏览/下载：1400/170 \| 提交时间：2009/09/22 薄膜 ITO透明导电膜基底温度直流磁控溅射 Crystal grain sizes Direct current magnetron sputtering Direct currents Glass substrates Indium oxides Interplanar spacings ITO transparent conductive thin films Mass fractions Substrate temperature X-ray diffractions
	非晶碳膜的PVD法制备、离子注入改性及其摩擦学性能研究学位论文 OAI收割理学硕士: 中国科学院兰州化学物理研究所, 2002 韩修训收藏 \| 浏览/下载：84/0 \| 提交时间：2014/04/14 非晶碳膜摩擦学性能直流磁控溅射离子注入 amorphous carbon films tribological performance direct-current magnetron sputtering ion implantation