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Chinese Academy of Sciences Institutional Repositories Grid
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CAS IR Grid
机构
上海光学精密机械研究... [3]
物理研究所 [1]
长春光学精密机械与物... [1]
化学研究所 [1]
西安光学精密机械研究... [1]
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OAI收割 [7]
内容类型
期刊论文 [5]
会议论文 [1]
学位论文 [1]
发表日期
2024 [1]
2007 [2]
2005 [1]
2000 [1]
1998 [1]
学科主题
光存储 [1]
光学工程 [1]
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Static spectroscopic ellipsometer based on division-of-amplitude polarization demodulation
期刊论文
OAI收割
Optics Communications, 2024, 卷号: 552
作者:
Li, Siyuan
;
Deng, Zhongxun
;
Quan, Naicheng
;
Zhang, Chunmin
  |  
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2023/11/23
Ellipsometer
Polarization state
Snapshot
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE)
会议论文
OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.
;
Gao W.
;
Liao Y.
;
Jing H.
;
Fu G.
收藏
  |  
浏览/下载:26/0
  |  
提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress
it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping
a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper
controlling different flow ratio of source gas SiH4 and NH3
and a great deal of tests (ellipsometer
infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators
three different capacitance samples in MIS structure were done
degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation
this result indicated that the defect density of this type SiN x was smaller
and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT
SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.
椭偏仪的研究进展
期刊论文
OAI收割
激光与光电子学进展, 2007, 卷号: 44, 期号: 3, 页码: 43, 49
杨坤
;
王向朝
;
步扬
收藏
  |  
浏览/下载:932/164
  |  
提交时间:2009/09/18
椭偏仪
ellipsometer
膜厚
thickness of thin film
折射率
refractive index
Studies on the reactive polyvinylidene fluoride-polyamide 6 interfaces: rheological properties and interfacial width
期刊论文
OAI收割
POLYMER, 2005, 卷号: 46, 期号: 7, 页码: 2365-2371
作者:
Wu, Y
;
Yu, XB
;
Yang, YM
;
Li, BY
;
Han, YC
  |  
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2019/04/09
Grafting Functionalization
Rheology
Ellipsometer
Dynamic storage performance of two cyanine dye films and optimization design for a recordable compact disk
期刊论文
OAI收割
appl. optics, 2000, 卷号: 39, 期号: 20, 页码: 3525, 3530
Li J
;
干福熹
收藏
  |  
浏览/下载:1516/273
  |  
提交时间:2009/09/22
SCANNING ELLIPSOMETER
POLARIZER
ANALYZER
Oscillation of polar Kerr rotation in PtCu/Co multilayers
期刊论文
OAI收割
JOURNAL OF APPLIED PHYSICS, 1998, 卷号: 83, 期号: 8, 页码: 4442
Li, J
;
Ma, PP
;
Wang, YJ
;
Guo, ZH
;
Chen, JC
;
Chen, LY
;
Zhang, RJ
收藏
  |  
浏览/下载:21/0
  |  
提交时间:2013/09/24
PERPENDICULAR MAGNETIC-ANISOTROPY
SCANNING ELLIPSOMETER
LAYERED STRUCTURES
CO/PT MULTILAYERS
FERMI-SURFACE
SUPERLATTICES
DEPENDENCE
ANALYZER
ALLOYS
大视场成像椭偏仪及其应用研究
学位论文
OAI收割
作者:
谷利元
  |  
收藏
  |  
浏览/下载:41/0
  |  
提交时间:2018/12/26
成像椭偏仪,大视场,测量技术,超薄金属薄膜,厚度参数,表面等离子体共振
Imaging Ellipsometer,Large field of view,Measuring technology,Ultra-thin metal film,Thickness parameter,Surface Plasmon Resonance