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	Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China Tan X. 收藏 \| 浏览/下载：29/0 \| 提交时间：2013/03/25 In ultraviolet spectroscopy groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order it is important to control the groove shape precisely so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method the required blaze angle is small we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides since the etched groove shape depends on the aspect ratio of the photoresist mask ridge if we wish to fabricate larger gratings with this method we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
	Crystallization and microstructure change of semiconductor active thin layer in polymer organic field-effect transistors 期刊论文 OAI收割 ACTA PHYSICA SINICA, 2011, 卷号: 60, 期号: 2, 页码: 27201 作者: Tian, XY; Zhao, SL; Xu, Z; Yao, JF; Zhang, FJ 收藏 \| 浏览/下载：26/0 \| 提交时间：2016/06/29 regioregular poly(3-hexylthiophene) organic field-effect transistors synchrotron radiation grazing incident X-ray diffraction self-organization microstructure
	Study of crystalline structure change of annealing-induced self-organization in polymer field-effect transistors 期刊论文 OAI收割 ACTA PHYSICA SINICA, 2011, 卷号: 60, 期号: 5, 页码: 57201 作者: Tian, XY; Zhao, SL; Xu, Z; Yao, JF; Zhang, FJ 收藏 \| 浏览/下载：41/0 \| 提交时间：2016/06/29 polymer field-effect transistor synchrotron radiation grazing incident X-ray diffraction self-organization annealing
	High resolution X-ray diffraction investigation of epitaxially grown SrTiO3 thin films by laser-MBE 期刊论文 OAI收割 CHINESE PHYSICS C, 2009, 卷号: 33, 期号: 11, 页码: 949-953 作者: Zhai, ZY; Wu, XS; Jia QJ(贾全杰); Jia, QJ 收藏 \| 浏览/下载：29/0 \| 提交时间：2016/06/29 laser-MBE grazing incident X-ray diffraction reciprocal space mapping
	High resolution X-ray diffraction investigation of epitaxially grown SrTiO_3 thin films by laser-MBE 期刊论文 OAI收割中国物理C, 2009, 期号: 11, 页码: 949-953 作者: Zhai ZY(翟章印); Wu XS(吴小山); Jia QJ(贾全杰) 收藏 \| 浏览/下载：18/0 \| 提交时间：2015/12/25 laser-MBE grazing incident X-ray diffraction reciprocal space mapping
	Study of strain and composition of the self-organized GE dots by grazing incident X-ray diffraction 期刊论文 OAI收割 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2001, 卷号: 467, 期号: 1, 页码: 362-365 作者: Jiang XM(姜晓明); Jia QJ(贾全杰); Zheng WL(郑文莉); Xian DC(冼鼎昌); Jiang, XX 收藏 \| 浏览/下载：16/0 \| 提交时间：2016/06/27 Ge dots strain and composition grazing incident X-ray diffraction
	Development of synchrotron radiation X-ray grazing incident diffraction method 期刊论文 OAI收割 HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION, 2000, 卷号: 24, 期号: 12, 页码: 1185-1190 作者: Jiang XM(姜晓明); Jia QJ(贾全杰); Zheng WL(郑文莉); 刘鹏(多); Xian DC(冼鼎昌) 收藏 \| 浏览/下载：40/0 \| 提交时间：2016/06/29 grazing incident diffraction surface structure quantum dot weak signal