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浏览/检索结果: 共9条，第1-9条 帮助

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Design of a high-resolution compact optical system applied to micro-nano satellites 会议论文  OAI收割
Nanjing, China, 2020-10-20
作者:  Qiao, Jiang;  Wu, Cuigang
  |  收藏  |  浏览/下载：22/0  |  提交时间：2021/01/20
Photonic Nanojet Sub-Diffraction Nano-Fabrication With in situ Super-Resolution Imaging 期刊论文  OAI收割
IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2019, 卷号: 18, 页码: 226-233
作者:  Wen YD(文扬东);  Li WJ(李文荣);  Liu LQ(刘连庆);  Wang XD(王晓朵);  Wang FF(王飞飞)
  |  收藏  |  浏览/下载：71/0  |  提交时间：2019/03/09
Efficient Super-Resolution Imaging Method for Micro-Nano Structure Based On Structured Illumination Modulation 会议论文  OAI收割
Chengdu, PEOPLES R CHINAChengdu, PEOPLES R CHINA, JUN 26-29, 2018JUN 26-29, 2018
作者:  Yang Kejun;  Tang Yan;  Hu Song;  Chen Chuyi
  |  收藏  |  浏览/下载：38/0  |  提交时间：2019/08/23
Formation, distribution, and photoreaction of nano-sized vanadium oxide cluster anions 期刊论文  OAI收割
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2016, 卷号: 407, 页码: 62-68
作者:  Yuan, Zhen;  Liu, Qing-Yu;  Li, Xiao-Na;  He, Sheng-Gui
收藏  |  浏览/下载：24/0  |  提交时间：2016/12/29
Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review 期刊论文  OAI收割
MICROMACHINES, 2016, 卷号: 7, 期号: 7
作者:  Wang, Changtao;  Zhang, Wei;  Zhao, Zeyu;  Wang, Yanqin;  Gao, Ping
收藏  |  浏览/下载：29/0  |  提交时间：2016/11/15
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility 期刊论文  OAI收割
MICROELECTRONIC ENGINEERING, 2016, 卷号: 155, 页码: 55-60
作者:  Fan, D;  Buitrago, E;  Yang, SM;  Karim, W;  Wu, YQ
收藏  |  浏览/下载：16/0  |  提交时间：2017/03/02
A real-time axial activeanti-drift device with high-precision 期刊论文  OAI收割
acta physica sinica, 2015, 卷号: 64, 期号: 2, 页码: 028701
作者:  Huo Ying-Dong;  Cao Bo;  Yu Bin;  Chen Dan-Ni;  Niu Han-Ben
收藏  |  浏览/下载：17/0  |  提交时间：2015/07/14
Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm (EI CONFERENCE) 会议论文  OAI收割
2012 12th IEEE International Conference on Nanotechnology, NANO 2012, August 20, 2012 - August 23, 2012, Birmingham, United kingdom
作者:  Li S.;  Du J.;  Shi L.
收藏  |  浏览/下载：136/0  |  提交时间：2013/03/25
A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express  Vol. 16  No. 19 (2008) 14397]. Following that  to break the limitations in resolution and PSs period of NSSL method  in this paper  we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method  contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example  the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results  we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. 2012 IEEE.  
Surface plasmon polariton radiation from metallic photonic crystal slabs breaking the diffraction limit: Nano-storage and nano-fabrication 期刊论文  OAI收割
MODERN PHYSICS LETTERS B, 2004, 卷号: 18, 期号: 18, 页码: 945-953
作者:  Luo, XG;  Shi, JP;  Wang, H;  Yu, GB
收藏  |  浏览/下载：14/0  |  提交时间：2015/09/21