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Chinese Academy of Sciences Institutional Repositories Grid
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CAS IR Grid
机构
物理研究所 [1]
长春光学精密机械与物... [1]
半导体研究所 [1]
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OAI收割 [3]
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期刊论文 [2]
会议论文 [1]
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2014 [1]
2006 [2]
学科主题
半导体物理 [1]
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Improvement on InGaN-based light emitting diodes using p-GaN layer grown at low temperature in full N-2 environment
期刊论文
OAI收割
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2014, 卷号: 211, 期号: 5, 页码: 1175
Deng, Z
;
Jiang, Y
;
Zuo, P
;
Fang, YT
;
Ma, ZG
;
Jia, HQ
;
Zhou, JM
;
Chen, H
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  |  
浏览/下载:35/0
  |  
提交时间:2015/04/14
efficiency droop
GaN light emitting diodes
low temperature
p-GaN layer
Ultraviolet electroluminescence of ZnO based heterojunction light emitting diode (EI CONFERENCE)
会议论文
OAI收割
12th International Conference on II-VI Compounds, September 12, 2005 - September 16, 2005, Warsaw, Poland
Jiao S. J.
;
Lu Y. M.
;
Shen D. Z.
;
Zhang Z. Z.
;
Li B. H.
;
Zhang J. Y.
;
Yao B.
;
Liu Y. C.
;
Fan X. W.
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  |  
浏览/下载:26/0
  |  
提交时间:2013/03/25
ZnO/GaN p-i-n heterojunctions light emitting diodes were fabricated by plasma-assisted molecular beam epitaxy. We make use of high resistivity of nitrogen doped ZnO to fabricate n-ZnO/i-ZnO/p-GaN heterojunction light emitting diode. The emission of i-ZnO was obtained due to the limitation effect of i-ZnO on electrons and holes. Moreover
n-ZnO/i-MgO/p-GaN heterojunction light emitting diode was also fabricated. The limitation effect on electrons is increased in this heterojunction. The bright ultraviolet electroluminescence at 382 nm originating from the ZnO layer was observed in the room temperature electroluminescence spectrum. We hope to realize the stimulated emission of ZnO using these heterojunctions by the improvement of crystal quality and the optimization of device structure. 2006 WILEY-VCH Verlag GmbH Co. KGaA.
Dependence of intrinsic defects in ZnO films on oxygen fraction studied by positron annihilation
期刊论文
OAI收割
chinese physics letters, 2006, 卷号: 23, 期号: 2, 页码: 489-492
Peng CX
;
Weng HM
;
Yang XJ
;
Ye BJ
;
Cheng B
;
Zhou XY
;
Han RD
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浏览/下载:247/9
  |  
提交时间:2010/04/11
P-TYPE ZNO
THIN-FILMS
ROOM-TEMPERATURE
PHOTOLUMINESCENCE
DEPOSITION
SUBSTRATE
VACANCIES
LAYER
BEAM
GAN