机构

• 长春光学精密机械与物... [1]
• 自动化研究所 [1]

采集方式

• OAI收割 [2]

内容类型

• 会议论文 [1]
• 学位论文 [1]

发表日期

• 2011 [1]
• 2007 [1]

学科主题

筛选

浏览/检索结果: 共2条，第1-2条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文  OAI收割 International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China Tan X. 收藏  |  浏览/下载：25/0  |  提交时间：2013/03/25 In ultraviolet spectroscopy  groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore  there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order  it is important to control the groove shape precisely  so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm  especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method  the required blaze angle is small  we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles  and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model  the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides  since the etched groove shape depends on the aspect ratio of the photoresist mask ridge  if we wish to fabricate larger gratings with this method  we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).   掩模传输系统的运动控制与预对准方法研究 学位论文  OAI收割 工学博士, 中国科学院自动化研究所: 中国科学院研究生院, 2007 作者:  刘云 收藏  |  浏览/下载：106/0  |  提交时间：2015/09/02 掩模版  四象限光电探测器  粗预对准  精细预对准  显微视觉  运动控制  Petri网  photo mask  FQPD  coarse pre-alignment  fine pre-alignment  microscopic vision  motion control  Petri net