中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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  • 2016 [3]
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Reduction of NiGe/n-and p-Ge Specific Contact Resistivity by Enhanced Dopant Segregation in the Presence of Carbon During Nickel Germanidation 期刊论文  OAI收割
IEEE Transactions on Electron Devices, 2016
作者:  
Duan NY(段宁远);  Wang GL(王桂磊)
  |  收藏  |  浏览/下载:15/0  |  提交时间:2017/05/09
Study of SiGe selective epitaxial process integration with high-k and metal gate for 16/14 nm nodes FinFET technology 期刊论文  OAI收割
Microelectronics Engineering, 2016
作者:  
Wang GL(王桂磊);  Qin ZL(秦长亮);  Yin HX(殷华湘);  Duan NY(段宁远);  Yang T(杨涛)
  |  收藏  |  浏览/下载:9/0  |  提交时间:2017/05/09
On the Manipulation of Phosphorus Diffusion as Well as the Reduction of Specific Contact Resistivity in Ge by Carbon Co-Doping 期刊论文  OAI收割
ECS Transactions, 2016
作者:  
Luo J(罗军);  Liu JB(刘金彪);  Eddy Simoen;  Wang GL(王桂磊);  Mao SJ(毛淑娟)
  |  收藏  |  浏览/下载:27/0  |  提交时间:2017/05/09