中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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CAS IR Grid
机构
沈阳自动化研究所 [2]
上海光学精密机械研究... [2]
合肥物质科学研究院 [2]
长春光学精密机械与物... [1]
采集方式
OAI收割 [7]
内容类型
期刊论文 [5]
会议论文 [2]
发表日期
2025 [1]
2024 [1]
2018 [1]
2014 [2]
2011 [2]
学科主题
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浏览/检索结果:
共7条,第1-7条
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Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism
期刊论文
OAI收割
APPLIED SURFACE SCIENCE, 2025, 卷号: 679
作者:
Zhu, Xiaoxiao
;
Ding, Juxuan
;
Mo, Zhangchao
;
Jiang, Xuesong
;
Sun, Jifei
  |  
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2024/11/20
Chemical mechanical polishing (CMP)
Ceria abrasive
Diamond abrasive
Interfacial chemical reaction
Material removal mechanism
Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives
期刊论文
OAI收割
TRIBOLOGY INTERNATIONAL, 2024, 卷号: 197
作者:
Zhu, Xiaoxiao
;
Gui, Yuziyu
;
Fu, Hao
;
Ding, Juxuan
;
Mo, Zhangchao
  |  
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2024/11/20
Silicon carbide (SiC)
Photocatalytic-assisted chemical mechanical
polishing (PCMP)
Core/shell abrasives
Materials removal mechanism
Roughness Reduction of Large-Area High-Quality Thick Al Coatings for Large-Size Echelle Gratings by Chemical Mechanical Polishing
期刊论文
OAI收割
Nanoscience and Nanotechnology Letters, 2018, 卷号: 10, 期号: 1, 页码: 69-74
作者:
Song, C.
;
Li, Z. Z.
;
Zhang, X.
;
Li, Q.
;
Yang, H. G.
  |  
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2019/09/17
Thick Al Coatings
Echelle Grating
Chemical Mechanical Polishing
design
telescope
mirrors
Science & Technology - Other Topics
Materials Science
Physics
Factor Effect on Material Removal Rate During Phosphate Laser Glass Polishing
期刊论文
OAI收割
mater. manuf. process., 2014, 卷号: 29, 期号: 6, 页码: 721
作者:
Chen, Guokai
;
Yi, Kui
;
Yang, Minghong
;
Liu, Wenwen
;
Xu, Xueke
收藏
  |  
浏览/下载:20/0
  |  
提交时间:2016/11/28
Ceria
Chemical
Glass
Laser
Material
Mechanical
Phosphate
Polishing
Rate
Removal
Factor Effect on Material Removal Rate During Phosphate Laser Glass Polishing
期刊论文
OAI收割
mater. manuf. process., 2014, 卷号: 29, 期号: 6, 页码: 721
作者:
Chen, Guokai
;
Yi, Kui
;
Yang, Minghong
;
Liu, Wenwen
;
Xu, Xueke
收藏
  |  
浏览/下载:25/0
  |  
提交时间:2016/11/28
Ceria
Chemical
Glass
Laser
Material
Mechanical
Phosphate
Polishing
Rate
Removal
Neural Network Predictive R2R Control to CMP Process
会议论文
OAI收割
2011 4th IEEE International Conference on Computer Science and Information Technology, Chengdu, China, June 10-12, 2011
作者:
Wang L(王亮)
;
Hu JT(胡静涛)
收藏
  |  
浏览/下载:46/0
  |  
提交时间:2012/06/06
chemical mechanical polishing
RBF neural network
predictive control
run-to-run control
PSO rolling optimization
Fuzzy predictive R2R control to CMP process
会议论文
OAI收割
2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011, Shanghai, China, June 10-12, 2011
作者:
Wang L(王亮)
;
Hu JT(胡静涛)
收藏
  |  
浏览/下载:27/0
  |  
提交时间:2012/06/06
Chemical mechanical polishing
Clustering algorithms
Computer science
Controllers
Industrial applications
Mathematical models
Polishing
Predictive control systems
Semiconductor device manufacture
Stripping (removal)