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	High-performance etching of multilevel phase-type Fresnel zone plates with large apertures 期刊论文 OAI收割 Optics Communications, 2018, 卷号: 407, 页码: 227-233 作者: Guo, C. L.; Zhang, Z. Y.; Xue, D. L.; Li, L. X.; Wang, R. Q. \| 收藏 \| 浏览/下载：17/0 \| 提交时间：2019/09/17 Fresnel zone plate Diffractive optical elements Etching depth uniformity Ion beam etching Dwell time algorithm dwell-time algorithm dielectric gratings fabrication errors x-ray ion Optics
	Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China Tan X. 收藏 \| 浏览/下载：25/0 \| 提交时间：2013/03/25 In ultraviolet spectroscopy groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order it is important to control the groove shape precisely so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method the required blaze angle is small we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides since the etched groove shape depends on the aspect ratio of the photoresist mask ridge if we wish to fabricate larger gratings with this method we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
	Planar refractive microlens arrays in indium phosphide and quartz substrates 期刊论文 iSwitch采集 Optical engineering, 2008, 卷号: 47, 期号: 5, 页码: 15 作者: Zhang, Xinyu; Xie, Changsheng; Ji, An; Tang, Qingle; Luo, Wei 收藏 \| 浏览/下载：30/0 \| 提交时间：2019/05/12 Concave refractive microlens array Planar refractive microlens array Ion beam etching
	Planar refractive microlens arrays in indium phosphide and quartz substrates 期刊论文 OAI收割 optical engineering, 2008, 卷号: 47, 期号: 5, 页码: art. no. 054001 Zhang, XY; Xie, CS; Ji, A; Tang, Q; Luo, W 收藏 \| 浏览/下载：70/13 \| 提交时间：2010/03/08 concave refractive microlens array planar refractive microlens array ion beam etching
	Fabrication of multilayer laminar grating with high efficiency for extreme ultraviolet (EI CONFERENCE) 会议论文 OAI收割 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Advanced Optical Manufacturing Technologies, July 8, 2007 - July 12, 2007, Chengdu, China 作者: Jin C.-S.; Zhang L.-C. 收藏 \| 浏览/下载：22/0 \| 提交时间：2013/03/25 The main goal for investigations on multilayer laminar gratings working at the EUV region is to enhance their efficiency. In this article second third we demonstrate a routine to fabricate multilayer laminar gratings with high efficiency. This routine comprises three steps: first optimizing fabricating techniques to obtain multilayer coatings with high reflectivity strictly controlling errors of multilayer grating parameters to ensure the coinciding of the optical performance with the expectation. Results demonstrate that this routine is feasible. The measured peak efficiency of -1 order at 12.8nm was 14.3%. Some related issues about efficiency curves such as wavelength separation and suppression of zero order are discussed. preparing grating substrates with ideal groove profile and low roughness by holographic recording and ion beam etching process
	Etching effects of low energy argon ion beam on porous anodic aluminum oxide membranes 期刊论文 OAI收割 ACTA PHYSICA SINICA, 2006, 卷号: 55, 期号: 3, 页码: 1517 Sen, W（王森）; Yu, GJ（俞国军）; Gong, JL; Li, QT; Zhu, DZ; Zhu, ZY 收藏 \| 浏览/下载：8/0 \| 提交时间：2012/05/11 porous anodic aluminum oxide membrane ion beam etching