机构

• 长春光学精密机械与物... [3]
• 光电技术研究所 [2]
• 沈阳自动化研究所 [1]
• 上海光学精密机械研究... [1]

采集方式

• OAI收割 [7]

内容类型

• 期刊论文 [5]
• 会议论文 [1]
• 学位论文 [1]

发表日期

• 2020 [1]
• 2019 [1]
• 2018 [1]
• 2012 [1]
• 2009 [1]
• 2008 [1]
• 更多

学科主题

• 光学工程 [1]

筛选

浏览/检索结果: 共7条，第1-7条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 Modular and Customized Fabrication of 3D Functional Microgels for Bottom-Up Tissue Engineering and Drug Screening 期刊论文  OAI收割 ADVANCED MATERIALS TECHNOLOGIES, 2020, 卷号: 5, 期号: 5, 页码: 1-7 作者:  Yang WG(杨文广);  Cai SX(蔡树向);  Chen, Yibao;  Liang WF(梁文峰);  Lai YB(来佑彬)   |  收藏  |  浏览/下载：44/0  |  提交时间：2020/03/22 drug screening  microgels  optofluidic maskless lithography  tissue engineering   Analysis and correction of the distortion error in a DMD based scanning lithography system 期刊论文  OAI收割 Optics Communications, 2019, 卷号: 434, 页码: 1-6 作者:  Q.K.Li;  Y.Xiao;  H.Liu;  H.L.Zhang;  J.Xu   |  收藏  |  浏览/下载：39/0  |  提交时间：2020/08/24 Microlithography,Lithography,Digital image processing,maskless lithography,fabrication,Optics   Illumination uniformity improvement in digital micromirror device based scanning photolithography system 期刊论文  OAI收割 Optics Express, 2018, 卷号: 26, 期号: 14, 页码: 18597-18607 作者:  Xiong, Z.;  Liu, H.;  Chen, R. H.;  Xu, J.;  Li, Q. K.   |  收藏  |  浏览/下载：13/0  |  提交时间：2019/09/17 maskless lithography  dmd  fabrication  elements  Optics   Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm (EI CONFERENCE) 会议论文  OAI收割 2012 12th IEEE International Conference on Nanotechnology, NANO 2012, August 20, 2012 - August 23, 2012, Birmingham, United kingdom 作者:  Li S.;  Du J.;  Shi L. 收藏  |  浏览/下载：137/0  |  提交时间：2013/03/25 A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express  Vol. 16  No. 19 (2008) 14397]. Following that  to break the limitations in resolution and PSs period of NSSL method  in this paper  we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method  contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example  the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results  we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. 2012 IEEE.   Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System 期刊论文  OAI收割 JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE, 2009, 卷号: 6, 期号: 5, 页码: 1170-1174 作者:  Jiang, Wenbo;  Hu, Song;  Zhao, Lixin;  Yan, Wei;  Yang, Yong 收藏  |  浏览/下载：27/0  |  提交时间：2015/09/21 Maskless Lithography  Key Techniques  Lithographic Experiment  Nanoscale   RET simulations for SLM-based maskless lithography 期刊论文  OAI收割 MICROELECTRONIC ENGINEERING, 2008, 卷号: 85, 期号: 5-6, 页码: 929-933 作者:  Guo, XlaoWei;  Du, Jinglei;  Luo, Xiangang;  Deng, Qiling 收藏  |  浏览/下载：20/0  |  提交时间：2015/09/21 optical maskless lithography  spatial light modulator  reticle enhancement technique   桌面式无掩膜光刻系统的研制 学位论文  OAI收割 作者:  梁鑫   |  收藏  |  浏览/下载：72/0  |  提交时间：2018/12/26 桌面式光刻系统  Maskless lithography  小孔检焦系统  automatic tracking  自动跟踪系统  flatness measurement  运动平整度检测