机构

• 沈阳自动化研究所 [2]
• 上海光学精密机械研究... [2]
• 合肥物质科学研究院 [2]
• 力学研究所 [1]
• 金属研究所 [1]
• 长春光学精密机械与物... [1]
• 更多

采集方式

• OAI收割 [10]

内容类型

• 期刊论文 [8]
• 会议论文 [2]

发表日期

• 2025 [1]
• 2024 [1]
• 2022 [1]
• 2019 [1]
• 2018 [1]
• 2016 [1]
• 更多

学科主题

筛选

浏览/检索结果: 共10条，第1-10条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序作者升序作者降序 Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism 期刊论文  OAI收割 APPLIED SURFACE SCIENCE, 2025, 卷号: 679 作者:  Zhu, Xiaoxiao;  Ding, Juxuan;  Mo, Zhangchao;  Jiang, Xuesong;  Sun, Jifei   |  收藏  |  浏览/下载：14/0  |  提交时间：2024/11/20 Chemical mechanical polishing (CMP)  Ceria abrasive  Diamond abrasive  Interfacial chemical reaction  Material removal mechanism   Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives 期刊论文  OAI收割 TRIBOLOGY INTERNATIONAL, 2024, 卷号: 197 作者:  Zhu, Xiaoxiao;  Gui, Yuziyu;  Fu, Hao;  Ding, Juxuan;  Mo, Zhangchao   |  收藏  |  浏览/下载：17/0  |  提交时间：2024/11/20 Silicon carbide (SiC)  Photocatalytic-assisted chemical mechanical  polishing (PCMP)  Core/shell abrasives  Materials removal mechanism   A novel method for fabricating micro-dimple arrays with good surface quality on metallic glass substrate by combining laser irradiation and mechanical polishing under wax sealing 期刊论文  OAI收割 JOURNAL OF MANUFACTURING PROCESSES, 2022, 卷号: 79, 页码: 911-923 作者:  Huang, Hu;  Qian, Yongfeng;  Zhang, Lin;  Jiang MQ(蒋敏强);  Yan, Jiwang   |  收藏  |  浏览/下载：45/0  |  提交时间：2022/08/10 Metallic glass  Laser irradiation  Mechanical polishing  micro-dimple array  Surface quality  micro  nano-manufacturing   Effects of mechanical polishing treatments on high cycle fatigue behavior of Ti-6Al-2Sn-4Zr-2Mo alloy 期刊论文  OAI收割 INTERNATIONAL JOURNAL OF FATIGUE, 2019, 卷号: 121, 页码: 55-62 作者:  Yuan, Fusen;  Liu, Chengze;  Gu, Hengfei;  Han, Fuzhou;  Zhang, Yingdong   |  收藏  |  浏览/下载：15/0  |  提交时间：2021/02/02 Ti-6Al-2Sn-4Zr-2Mo  High cycle fatigue  Mechanical polishing treatment  Surface roughness  Residual stress   Roughness Reduction of Large-Area High-Quality Thick Al Coatings for Large-Size Echelle Gratings by Chemical Mechanical Polishing 期刊论文  OAI收割 Nanoscience and Nanotechnology Letters, 2018, 卷号: 10, 期号: 1, 页码: 69-74 作者:  Song, C.;  Li, Z. Z.;  Zhang, X.;  Li, Q.;  Yang, H. G.   |  收藏  |  浏览/下载：24/0  |  提交时间：2019/09/17 Thick Al Coatings  Echelle Grating  Chemical Mechanical Polishing  design  telescope  mirrors  Science & Technology - Other Topics  Materials Science  Physics   The advancement of the high precision stress polishing 期刊论文  OAI收割 Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 2016, 卷号: 9683, 页码: 96831F 作者:  Li, Chaoqiang;  Lei, Baiping;  Han, Yu   |  收藏  |  浏览/下载：27/0  |  提交时间：2018/06/14 Aspherics  Error Analysis  Manufacture  Mechanical Actuators  Mirrors  Polishing   Factor Effect on Material Removal Rate During Phosphate Laser Glass Polishing 期刊论文  OAI收割 mater. manuf. process., 2014, 卷号: 29, 期号: 6, 页码: 721 作者:  Chen, Guokai;  Yi, Kui;  Yang, Minghong;  Liu, Wenwen;  Xu, Xueke 收藏  |  浏览/下载：22/0  |  提交时间：2016/11/28 Ceria  Chemical  Glass  Laser  Material  Mechanical  Phosphate  Polishing  Rate  Removal   Factor Effect on Material Removal Rate During Phosphate Laser Glass Polishing 期刊论文  OAI收割 mater. manuf. process., 2014, 卷号: 29, 期号: 6, 页码: 721 作者:  Chen, Guokai;  Yi, Kui;  Yang, Minghong;  Liu, Wenwen;  Xu, Xueke 收藏  |  浏览/下载：25/0  |  提交时间：2016/11/28 Ceria  Chemical  Glass  Laser  Material  Mechanical  Phosphate  Polishing  Rate  Removal   Neural Network Predictive R2R Control to CMP Process 会议论文  OAI收割 2011 4th IEEE International Conference on Computer Science and Information Technology, Chengdu, China, June 10-12, 2011 作者:  Wang L(王亮);  Hu JT(胡静涛) 收藏  |  浏览/下载：50/0  |  提交时间：2012/06/06 chemical mechanical polishing  RBF neural network  predictive control  run-to-run control  PSO rolling optimization   Fuzzy predictive R2R control to CMP process 会议论文  OAI收割 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011, Shanghai, China, June 10-12, 2011 作者:  Wang L(王亮);  Hu JT(胡静涛) 收藏  |  浏览/下载：30/0  |  提交时间：2012/06/06 Chemical mechanical polishing  Clustering algorithms  Computer science  Controllers  Industrial applications  Mathematical models  Polishing  Predictive control systems  Semiconductor device manufacture  Stripping (removal)