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Assessing cognitive biases induced by acute formalin or hotplate treatment: an animal study using affective bias test 期刊论文  OAI收割
FRONTIERS IN BEHAVIORAL NEUROSCIENCE, 2024, 卷号: 18, 页码: 8
作者:  
Zhang, Yu-Han;  Lin, Jie-Xuan;  Wang, Ning;  Wang, Jin-Yan;  Luo, Fei
  |  收藏  |  浏览/下载:26/0  |  提交时间:2024/03/04
Application of Cognitive Bias Testing in neuropsychiatric disorders: A Mini-Review based on animal studies 期刊论文  OAI收割
Frontiers in behavioral neuroscience, 2022, 卷号: 16, 页码: 16:924319
作者:  
Yu-Han Zhang;  Ning Wang;  Xiao-Xiao Lin;  Jin-Yan Wang;  Fei Luo
  |  收藏  |  浏览/下载:39/0  |  提交时间:2022/08/01
Does Approach-Avoidance Behavior in Response to Ambiguous Cues Reflect Depressive Interpretation Bias? Related but Distinct 期刊论文  OAI收割
COGNITIVE THERAPY AND RESEARCH, 2020, 卷号: 44, 页码: 1091–1105
作者:  
Lin, Xiao-Xiao;  Si, Shang-Wen;  Gao, Rui-Rui;  Sun, Ya-Bin
  |  收藏  |  浏览/下载:30/0  |  提交时间:2020/08/24
RESEARCH AND ANALYSIS ON STABILITY OF BOLT REINFORCED TUNNEL IN ANISOTROPIC LAYERED ROCK MASS WITH LOW INCLINATION ANGLE STRATIFICATION 会议论文  OAI收割
Huazhong Univ Sci & Technol, NOV 17-19, 2012
作者:  
Li, Dan;  Bai, Shiwei;  Chen, Hao;  Xia, Binwei
  |  收藏  |  浏览/下载:24/0  |  提交时间:2018/06/05
Microstructure and mechanical properties of CrN coating deposited by arc ion plating on Ti6Al4V substrate 期刊论文  OAI收割
Surface & Coatings Technology, 2011, 卷号: 205, 期号: 19, 页码: 4690-4696
Z. K. Chang; X. S. Wan; Z. L. Pei; J. Gong; C. Sun
收藏  |  浏览/下载:22/0  |  提交时间:2012/04/13
Guilty by implicit racial bias: the guilty/not guilty Impicit Association Test 期刊论文  OAI收割
Ohio State Journal of Criminal Law, 2010, 卷号: 8, 页码: 187-208
作者:  
Levinson J.D.;  Cai H.;  Young D.;  Cai HJ(蔡华俭);  Cai HJ(蔡华俭)
  |  收藏  |  浏览/下载:19/0  |  提交时间:2011/12/02
The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films 期刊论文  OAI收割
Surface and Coatings Technology, 2008, 卷号: 202, 页码: 2684-2689
作者:  
Wang P(王鹏);  Zhang JY(张俊彦);  Wang LP(王立平);  Zhang GA(张广安)
收藏  |  浏览/下载:58/0  |  提交时间:2013/03/28
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE) 会议论文  OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.; Gao W.; Liao Y.; Jing H.; Fu G.
收藏  |  浏览/下载:26/0  |  提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress  it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping  a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper  controlling different flow ratio of source gas SiH4 and NH3  and a great deal of tests (ellipsometer  infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators  three different capacitance samples in MIS structure were done  degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation  this result indicated that the defect density of this type SiN x was smaller  and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT  SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.  
on statistical properties of s-boxes in block ciphers 期刊论文  OAI收割
CHINESE JOURNAL OF ELECTRONICS, 2005, 卷号: 14, 期号: 4, 页码: 584-587
Hua C; Wu CK; Feng DG
  |  收藏  |  浏览/下载:21/0  |  提交时间:2011/07/28